Metal nanodot array fabrication using self-assembled diblock copolymer

S. J. Kim; W. J. Maeng; D. H. Park; B. H. Sohn; H. Kim

doi:10.1109/NMDC.2006.4388830

Metal nanodot array fabrication using self-assembled diblock copolymer

S. J. Kim, W. J. Maeng, D. H. Park, B. H. Sohn, H. Kim

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

By combining PS-PMMA self-assembled diblock copolymer (BC) and lift off process, gold nanodot array was fabricated. For surface neutralization, a novel method using conventional self assembled monolayer (SAM), MPTS (3-(p-methoxyphenyl)propyltrichlro-silane) was used. Surface treatment with SAM was analyzed by contact angle measurement and XPS. Upon the fabricated cylindrical nanohole array, gold was evaporated and 10 nm size gold nanoparticle array was fabricated by lift-off process.

Original language	English
Title of host publication	2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
Pages	488-489
Number of pages	2
DOIs	https://doi.org/10.1109/NMDC.2006.4388830
Publication status	Published - 2006
Event	2006 IEEE Nanotechnology Materials and Devices Conference, NMDC - Gyeongju, Korea, Republic of Duration: 2006 Oct 22 → 2006 Oct 25

Publication series

Name	2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
Volume	1

Other

Other	2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
Country/Territory	Korea, Republic of
City	Gyeongju
Period	06/10/22 → 06/10/25

All Science Journal Classification (ASJC) codes

Electrical and Electronic Engineering
General Materials Science

Access to Document

10.1109/NMDC.2006.4388830

Cite this

@inproceedings{63ae80a0d8f742999463235b5fa3bcef,

title = "Metal nanodot array fabrication using self-assembled diblock copolymer",

abstract = "By combining PS-PMMA self-assembled diblock copolymer (BC) and lift off process, gold nanodot array was fabricated. For surface neutralization, a novel method using conventional self assembled monolayer (SAM), MPTS (3-(p-methoxyphenyl)propyltrichlro-silane) was used. Surface treatment with SAM was analyzed by contact angle measurement and XPS. Upon the fabricated cylindrical nanohole array, gold was evaporated and 10 nm size gold nanoparticle array was fabricated by lift-off process.",

keywords = "Diblock copolymer, Nanodot, Self-assembled monolayer",

author = "Kim, {S. J.} and Maeng, {W. J.} and Park, {D. H.} and Sohn, {B. H.} and H. Kim",

year = "2006",

doi = "10.1109/NMDC.2006.4388830",

language = "English",

isbn = "1424405408",

series = "2006 IEEE Nanotechnology Materials and Devices Conference, NMDC",

pages = "488--489",

booktitle = "2006 IEEE Nanotechnology Materials and Devices Conference, NMDC",

note = "2006 IEEE Nanotechnology Materials and Devices Conference, NMDC ; Conference date: 22-10-2006 Through 25-10-2006",

}

Kim, SJ, Maeng, WJ, Park, DH, Sohn, BH & Kim, H 2006, Metal nanodot array fabrication using self-assembled diblock copolymer. in 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC., 4388830, 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC, vol. 1, pp. 488-489, 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC, Gyeongju, Korea, Republic of, 06/10/22. https://doi.org/10.1109/NMDC.2006.4388830

Metal nanodot array fabrication using self-assembled diblock copolymer. / Kim, S. J.; Maeng, W. J.; Park, D. H. et al.
2006 IEEE Nanotechnology Materials and Devices Conference, NMDC. 2006. p. 488-489 4388830 (2006 IEEE Nanotechnology Materials and Devices Conference, NMDC; Vol. 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Metal nanodot array fabrication using self-assembled diblock copolymer

AU - Kim, S. J.

AU - Maeng, W. J.

AU - Park, D. H.

AU - Sohn, B. H.

AU - Kim, H.

PY - 2006

Y1 - 2006

N2 - By combining PS-PMMA self-assembled diblock copolymer (BC) and lift off process, gold nanodot array was fabricated. For surface neutralization, a novel method using conventional self assembled monolayer (SAM), MPTS (3-(p-methoxyphenyl)propyltrichlro-silane) was used. Surface treatment with SAM was analyzed by contact angle measurement and XPS. Upon the fabricated cylindrical nanohole array, gold was evaporated and 10 nm size gold nanoparticle array was fabricated by lift-off process.

AB - By combining PS-PMMA self-assembled diblock copolymer (BC) and lift off process, gold nanodot array was fabricated. For surface neutralization, a novel method using conventional self assembled monolayer (SAM), MPTS (3-(p-methoxyphenyl)propyltrichlro-silane) was used. Surface treatment with SAM was analyzed by contact angle measurement and XPS. Upon the fabricated cylindrical nanohole array, gold was evaporated and 10 nm size gold nanoparticle array was fabricated by lift-off process.

KW - Diblock copolymer

KW - Nanodot

KW - Self-assembled monolayer

UR - http://www.scopus.com/inward/record.url?scp=50249169286&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=50249169286&partnerID=8YFLogxK

U2 - 10.1109/NMDC.2006.4388830

DO - 10.1109/NMDC.2006.4388830

M3 - Conference contribution

AN - SCOPUS:50249169286

SN - 1424405408

SN - 9781424405404

T3 - 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC

SP - 488

EP - 489

BT - 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC

T2 - 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC

Y2 - 22 October 2006 through 25 October 2006

ER -

Metal nanodot array fabrication using self-assembled diblock copolymer

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Other

All Science Journal Classification (ASJC) codes

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