Magnetotransport of semimetallic Bi thin films grown by electroplating and sputtering

K. I. Lee; M. H. Jeun; K. H. Lee; J. Y. Chang; J. G. Ha; K. H. Shin; S. H. Han; W. Y. Lee

Magnetotransport of semimetallic Bi thin films grown by electroplating and sputtering

K. I. Lee, M. H. Jeun, K. H. Lee, J. Y. Chang, J. G. Ha, K. H. Shin, S. H. Han, W. Y. Lee

Department of Materials Science and Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

The magnetotransport of semimetallic Bi thin films, grown by electroplating and sputtering, was discussed. It was found that the magnetoresistance increased from 5,200% to 80,000% after annealing for the 20 μm Bi film. The thickness dependence of the MR for the polycrystalline and single crystalline films was found in the range one to 20 μm.

Original language	English
Pages (from-to)	ES06
Journal	Digests of the Intermag Conference
Publication status	Published - 2003
Event	Intermag 2003: International Magnetics Conference - Boston, MA, United States Duration: 2003 Mar 28 → 2003 Apr 3

All Science Journal Classification (ASJC) codes

Electrical and Electronic Engineering

Cite this

@article{1e98ec37f3ac4d1887137c13e47fdd1f,

title = "Magnetotransport of semimetallic Bi thin films grown by electroplating and sputtering",

abstract = "The magnetotransport of semimetallic Bi thin films, grown by electroplating and sputtering, was discussed. It was found that the magnetoresistance increased from 5,200% to 80,000% after annealing for the 20 μm Bi film. The thickness dependence of the MR for the polycrystalline and single crystalline films was found in the range one to 20 μm.",

author = "Lee, {K. I.} and Jeun, {M. H.} and Lee, {K. H.} and Chang, {J. Y.} and Ha, {J. G.} and Shin, {K. H.} and Han, {S. H.} and Lee, {W. Y.}",

year = "2003",

language = "English",

pages = "ES06",

journal = "Digests of the Intermag Conference",

issn = "0074-6843",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "Intermag 2003: International Magnetics Conference ; Conference date: 28-03-2003 Through 03-04-2003",

}

TY - JOUR

T1 - Magnetotransport of semimetallic Bi thin films grown by electroplating and sputtering

AU - Lee, K. I.

AU - Jeun, M. H.

AU - Lee, K. H.

AU - Chang, J. Y.

AU - Ha, J. G.

AU - Shin, K. H.

AU - Han, S. H.

AU - Lee, W. Y.

PY - 2003

Y1 - 2003

N2 - The magnetotransport of semimetallic Bi thin films, grown by electroplating and sputtering, was discussed. It was found that the magnetoresistance increased from 5,200% to 80,000% after annealing for the 20 μm Bi film. The thickness dependence of the MR for the polycrystalline and single crystalline films was found in the range one to 20 μm.

AB - The magnetotransport of semimetallic Bi thin films, grown by electroplating and sputtering, was discussed. It was found that the magnetoresistance increased from 5,200% to 80,000% after annealing for the 20 μm Bi film. The thickness dependence of the MR for the polycrystalline and single crystalline films was found in the range one to 20 μm.

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UR - http://www.scopus.com/inward/citedby.url?scp=18844479565&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:18844479565

SN - 0074-6843

SP - ES06

JO - Digests of the Intermag Conference

JF - Digests of the Intermag Conference

T2 - Intermag 2003: International Magnetics Conference

Y2 - 28 March 2003 through 3 April 2003

ER -

Magnetotransport of semimetallic Bi thin films grown by electroplating and sputtering

Abstract

All Science Journal Classification (ASJC) codes

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