Magnetoresistance behavior in electroplated and sputtered Bi thin films

M. H. Jeun, K. I. Lee, K. H. Lee, D. Y. Kim, J. Y. Chang, K. H. Shin, S. H. Han, J. G. Ha, W. Y. Lee

Research output: Contribution to journalArticlepeer-review


The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.

Original languageEnglish
Pages (from-to)e1455-e1457
JournalJournal of Magnetism and Magnetic Materials
Issue numberSUPPL. 1
Publication statusPublished - 2004 May

Bibliographical note

Funding Information:
This work was supported by KIST Vision 21 Program and Korea Research Foundation Grant (KRF-2003-003-C00047). J.G. Ha thanks for Research Grant of Kwangwoon University in 2002.

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics


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