Magnetoresistance behavior in electroplated and sputtered Bi thin films

M. H. Jeun; K. I. Lee; K. H. Lee; D. Y. Kim; J. Y. Chang; K. H. Shin; S. H. Han; J. G. Ha; W. Y. Lee

doi:10.1016/j.jmmm.2003.12.733

Magnetoresistance behavior in electroplated and sputtered Bi thin films

M. H. Jeun, K. I. Lee, K. H. Lee, D. Y. Kim, J. Y. Chang, K. H. Shin, S. H. Han, J. G. Ha, W. Y. Lee

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.

Original language	English
Pages (from-to)	e1455-e1457
Journal	Journal of Magnetism and Magnetic Materials
Volume	272-276
Issue number	SUPPL. 1
DOIs	https://doi.org/10.1016/j.jmmm.2003.12.733
Publication status	Published - 2004 May

Bibliographical note

Funding Information:
This work was supported by KIST Vision 21 Program and Korea Research Foundation Grant (KRF-2003-003-C00047). J.G. Ha thanks for Research Grant of Kwangwoon University in 2002.

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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10.1016/j.jmmm.2003.12.733

Cite this

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title = "Magnetoresistance behavior in electroplated and sputtered Bi thin films",

abstract = "The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.",

author = "Jeun, {M. H.} and Lee, {K. I.} and Lee, {K. H.} and Kim, {D. Y.} and Chang, {J. Y.} and Shin, {K. H.} and Han, {S. H.} and Ha, {J. G.} and Lee, {W. Y.}",

note = "Funding Information: This work was supported by KIST Vision 21 Program and Korea Research Foundation Grant (KRF-2003-003-C00047). J.G. Ha thanks for Research Grant of Kwangwoon University in 2002. ",

year = "2004",

month = may,

doi = "10.1016/j.jmmm.2003.12.733",

language = "English",

volume = "272-276",

pages = "e1455--e1457",

journal = "Journal of Magnetism and Magnetic Materials",

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T1 - Magnetoresistance behavior in electroplated and sputtered Bi thin films

AU - Jeun, M. H.

AU - Lee, K. I.

AU - Lee, K. H.

AU - Kim, D. Y.

AU - Chang, J. Y.

AU - Shin, K. H.

AU - Han, S. H.

AU - Ha, J. G.

AU - Lee, W. Y.

N1 - Funding Information: This work was supported by KIST Vision 21 Program and Korea Research Foundation Grant (KRF-2003-003-C00047). J.G. Ha thanks for Research Grant of Kwangwoon University in 2002.

PY - 2004/5

Y1 - 2004/5

N2 - The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.

AB - The magnetotransport properties of the electroplated and sputtered Bi thin films have been investigated in the range 4-300K. Both the films are found to exhibit very large MR, ∼600%, at room temperature. The room temperature MR in the sputtered films depends on the grain size, in contrast to the electroplated films.

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JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

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ER -

Magnetoresistance behavior in electroplated and sputtered Bi thin films

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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