Magnetic and microstructural characterization of FeTaN high saturation materials for recording heads

Shan X. Wang; Jongill Hong

doi:10.1109/20.750645

Magnetic and microstructural characterization of FeTaN high saturation materials for recording heads

Shan X. Wang, Jongill Hong

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

17 Citations (Scopus)

Abstract

Magnetically soft FeTaN high saturation materials have been deposited on both sloping and planar surfaces by RF reactive sputtering with an appropriate high substrate bias. A perpendicular anisotropy component accompanying degrading soft magnetic properties is observed under low substrate bias. This undesirable perpendicular anisotropy in the FeTaN films arises from the magnetoelastic anisotropy due to in-plane compressive stress and positive magnetostriction constant, and from the magnetocrystalline anisotropy due to out-of-plane [200] easy axes. This is supported by X-ray pole figures, temperature-dependent VSM measurements, and synchrotron radiation X-ray stress measurements. The absence of microshape perpendicular anisotropy is supported by SQUID measurements and high resolution TEM images. This work has identified the processing parameters and microstructures that are critical for successfully incorporating high saturation magnetic materials in recording heads.

Original language	English
Pages (from-to)	782-787
Number of pages	6
Journal	IEEE Transactions on Magnetics
Volume	35
Issue number	2 PART 1
DOIs	https://doi.org/10.1109/20.750645
Publication status	Published - 1999

Bibliographical note

Funding Information:
Abstract-Magnetically soft FeTaN high saturation materials hale been deposited on both sloping and planar surfaces by RF reactive sputtering with an appropriate high substrate bias. A perpendicular anisotropy component accompanying degrading sofi: magnetic properties is observed under low substrate bias. This undesirable perpendicular anisotropy in the FeTaN films arises from the magnetoelastic anisotropy due to in-plane compressive stress and positive magnetostriction constant, and from the magnetocrystalline anisotropy due to out-of-plane [200] easy axes. This is supported by X-ray pole figures, temperature-dependent VSM measurements, and synchrotron radiation X- ray stress measurements. The absence of microshape perpendicular anisotropy is supported by SQUID measurements and high resolution TEM images. This work has identified the processing parameters and microstructures that are critical for successfully incorporating high saturation magnetic materials in recording heads.

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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10.1109/20.750645

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abstract = "Magnetically soft FeTaN high saturation materials have been deposited on both sloping and planar surfaces by RF reactive sputtering with an appropriate high substrate bias. A perpendicular anisotropy component accompanying degrading soft magnetic properties is observed under low substrate bias. This undesirable perpendicular anisotropy in the FeTaN films arises from the magnetoelastic anisotropy due to in-plane compressive stress and positive magnetostriction constant, and from the magnetocrystalline anisotropy due to out-of-plane [200] easy axes. This is supported by X-ray pole figures, temperature-dependent VSM measurements, and synchrotron radiation X-ray stress measurements. The absence of microshape perpendicular anisotropy is supported by SQUID measurements and high resolution TEM images. This work has identified the processing parameters and microstructures that are critical for successfully incorporating high saturation magnetic materials in recording heads.",

author = "Wang, {Shan X.} and Jongill Hong",

note = "Funding Information: Abstract-Magnetically soft FeTaN high saturation materials hale been deposited on both sloping and planar surfaces by RF reactive sputtering with an appropriate high substrate bias. A perpendicular anisotropy component accompanying degrading sofi: magnetic properties is observed under low substrate bias. This undesirable perpendicular anisotropy in the FeTaN films arises from the magnetoelastic anisotropy due to in-plane compressive stress and positive magnetostriction constant, and from the magnetocrystalline anisotropy due to out-of-plane [200] easy axes. This is supported by X-ray pole figures, temperature-dependent VSM measurements, and synchrotron radiation X- ray stress measurements. The absence of microshape perpendicular anisotropy is supported by SQUID measurements and high resolution TEM images. This work has identified the processing parameters and microstructures that are critical for successfully incorporating high saturation magnetic materials in recording heads.",

year = "1999",

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AU - Hong, Jongill

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PY - 1999

Y1 - 1999

N2 - Magnetically soft FeTaN high saturation materials have been deposited on both sloping and planar surfaces by RF reactive sputtering with an appropriate high substrate bias. A perpendicular anisotropy component accompanying degrading soft magnetic properties is observed under low substrate bias. This undesirable perpendicular anisotropy in the FeTaN films arises from the magnetoelastic anisotropy due to in-plane compressive stress and positive magnetostriction constant, and from the magnetocrystalline anisotropy due to out-of-plane [200] easy axes. This is supported by X-ray pole figures, temperature-dependent VSM measurements, and synchrotron radiation X-ray stress measurements. The absence of microshape perpendicular anisotropy is supported by SQUID measurements and high resolution TEM images. This work has identified the processing parameters and microstructures that are critical for successfully incorporating high saturation magnetic materials in recording heads.

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Magnetic and microstructural characterization of FeTaN high saturation materials for recording heads

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