Low-pressure nanoimprint lithography

Dahl Young Khang; Hyewon Kang; Tae Il Kim; Hong H. Lee

doi:10.1021/nl049887d

Low-pressure nanoimprint lithography

Dahl Young Khang, Hyewon Kang, Tae Il Kim, Hong H. Lee

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

119 Citations (Scopus)

Abstract

A low pressure (2-3 bar) nanoimprint lithography technique is developed that utilizes a thin fluoropolymer film (∼100 μm) mold. The flexible film mold allows imprinting of submicron pattern features at such a low pressure primarily due to "sequential" imprinting made possible by the mold flexibility and the conformai contact made between the film mold and the substrate. The surface energy of the fluoropolymer mold material is low enough that no mold surface treatment is needed for clean demolding. Easy replication of the film mold by a simple solvent casting is another advantage of the proposed method. Also the nanoscale (<100 nm) replication capability is demonstrated and discussed with a solvent-cast thin film fluoropolymer mold.

Original language	English
Pages (from-to)	633-637
Number of pages	5
Journal	Nano letters
Volume	4
Issue number	4
DOIs	https://doi.org/10.1021/nl049887d
Publication status	Published - 2004 Apr

All Science Journal Classification (ASJC) codes

Bioengineering
Chemistry(all)
Materials Science(all)
Condensed Matter Physics
Mechanical Engineering

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10.1021/nl049887d

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title = "Low-pressure nanoimprint lithography",

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AU - Kim, Tae Il

AU - Lee, Hong H.

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AB - A low pressure (2-3 bar) nanoimprint lithography technique is developed that utilizes a thin fluoropolymer film (∼100 μm) mold. The flexible film mold allows imprinting of submicron pattern features at such a low pressure primarily due to "sequential" imprinting made possible by the mold flexibility and the conformai contact made between the film mold and the substrate. The surface energy of the fluoropolymer mold material is low enough that no mold surface treatment is needed for clean demolding. Easy replication of the film mold by a simple solvent casting is another advantage of the proposed method. Also the nanoscale (<100 nm) replication capability is demonstrated and discussed with a solvent-cast thin film fluoropolymer mold.

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JO - Nano letters

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Low-pressure nanoimprint lithography

Abstract

All Science Journal Classification (ASJC) codes

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