Liquid crystal alignment effects on SiNx thin film layers treated by ion-beam irradiation

Sang Keuk Lee; Jong Hwan Kim; Byeong Yun Oh; Dong Hun Kang; Byoung Yong Kim; Jin Woo Han; Young Hwan Kim; Jeong Min Han; Jeoung Yeon Hwang; Chul Ho Ok; Dae Shik Seo

doi:10.1143/JJAP.46.7711

Liquid crystal alignment effects on SiN_x thin film layers treated by ion-beam irradiation

Sang Keuk Lee, Jong Hwan Kim, Byeong Yun Oh, Dong Hun Kang, Byoung Yong Kim, Jin Woo Han, Young Hwan Kim, Jeong Min Han, Jeoung Yeon Hwang, Chul Ho Ok, Dae Shik Seo

Department of Electrical and Electronic Engineering

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

Abstract

Nematic liquid crystal (NLC) alignment effects on SiN_x thin film layers treated by ion-beam irradiation for three types of N ratio were successfully studied for the first time. The SiN_x thin film was deposited by plasma-enhanced chemical vapor deposition using three types of N ratio. To characterize the film, atomic force microscopy was performed. Good LC aligning capabilities on the SiN_x thin film treated by ion-beam irradiation for all N ratios can be achieved. The low pretilt angle for an NLC on the SiN_x thin film treated by ion-beam irradiation was observed and could be adopted in planar alignment liquid crystal display applications as in-plane switching and fringe-field switching modes.

Original language	English
Pages (from-to)	7711-7713
Number of pages	3
Journal	Japanese Journal of Applied Physics
Volume	46
Issue number	12
DOIs	https://doi.org/10.1143/JJAP.46.7711
Publication status	Published - 2007 Dec 6

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

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@article{d2afd3ed0d19438f8ea8eb0b07211b87,

title = "Liquid crystal alignment effects on SiNx thin film layers treated by ion-beam irradiation",

abstract = "Nematic liquid crystal (NLC) alignment effects on SiNx thin film layers treated by ion-beam irradiation for three types of N ratio were successfully studied for the first time. The SiNx thin film was deposited by plasma-enhanced chemical vapor deposition using three types of N ratio. To characterize the film, atomic force microscopy was performed. Good LC aligning capabilities on the SiNx thin film treated by ion-beam irradiation for all N ratios can be achieved. The low pretilt angle for an NLC on the SiNx thin film treated by ion-beam irradiation was observed and could be adopted in planar alignment liquid crystal display applications as in-plane switching and fringe-field switching modes.",

author = "Lee, {Sang Keuk} and Kim, {Jong Hwan} and Oh, {Byeong Yun} and Kang, {Dong Hun} and Kim, {Byoung Yong} and Han, {Jin Woo} and Kim, {Young Hwan} and Han, {Jeong Min} and Hwang, {Jeoung Yeon} and Ok, {Chul Ho} and Seo, {Dae Shik}",

year = "2007",

month = dec,

day = "6",

doi = "10.1143/JJAP.46.7711",

language = "English",

volume = "46",

pages = "7711--7713",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

number = "12",

}

TY - JOUR

T1 - Liquid crystal alignment effects on SiNx thin film layers treated by ion-beam irradiation

AU - Lee, Sang Keuk

AU - Kim, Jong Hwan

AU - Oh, Byeong Yun

AU - Kang, Dong Hun

AU - Kim, Byoung Yong

AU - Han, Jin Woo

AU - Kim, Young Hwan

AU - Han, Jeong Min

AU - Hwang, Jeoung Yeon

AU - Ok, Chul Ho

AU - Seo, Dae Shik

PY - 2007/12/6

Y1 - 2007/12/6

N2 - Nematic liquid crystal (NLC) alignment effects on SiNx thin film layers treated by ion-beam irradiation for three types of N ratio were successfully studied for the first time. The SiNx thin film was deposited by plasma-enhanced chemical vapor deposition using three types of N ratio. To characterize the film, atomic force microscopy was performed. Good LC aligning capabilities on the SiNx thin film treated by ion-beam irradiation for all N ratios can be achieved. The low pretilt angle for an NLC on the SiNx thin film treated by ion-beam irradiation was observed and could be adopted in planar alignment liquid crystal display applications as in-plane switching and fringe-field switching modes.

AB - Nematic liquid crystal (NLC) alignment effects on SiNx thin film layers treated by ion-beam irradiation for three types of N ratio were successfully studied for the first time. The SiNx thin film was deposited by plasma-enhanced chemical vapor deposition using three types of N ratio. To characterize the film, atomic force microscopy was performed. Good LC aligning capabilities on the SiNx thin film treated by ion-beam irradiation for all N ratios can be achieved. The low pretilt angle for an NLC on the SiNx thin film treated by ion-beam irradiation was observed and could be adopted in planar alignment liquid crystal display applications as in-plane switching and fringe-field switching modes.

UR - http://www.scopus.com/inward/record.url?scp=37549022641&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=37549022641&partnerID=8YFLogxK

U2 - 10.1143/JJAP.46.7711

DO - 10.1143/JJAP.46.7711

M3 - Article

AN - SCOPUS:37549022641

SN - 0021-4922

VL - 46

SP - 7711

EP - 7713

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 12

ER -

Liquid crystal alignment effects on SiN_x thin film layers treated by ion-beam irradiation

Abstract

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