To fabricate a n-ZnO/p-CuI heterojunction diode with a high rectification ratio at a large junction area, γ-CuI film was spin-coated on ZnO. Since the n-ZnO/p-CuI diode showed a rectification ratio as small as 2.38 × 102, the ZnS interfacial layer was prepared by successive ionic layer adsorption and reaction. By placing a ZnS layer between the n-ZnO/p-CuI, the rectification ratio from the diode increased to 1.71 × 107 at a junction area of 1 cm2. Modification of the valence band offset and the conduction band offset of the n-ZnO/p-CuI junction in the presence of the interfacial ZnS layer may facilitate carrier transport between ZnO and CuI. In addition, it was confirmed that two types of defects (oxygen vacancy and unpaired electron trapped on an oxygen vacancy) were reduced by insertion of an interfacial ZnS layer. A significant improvement in the rectification ratio resulted from the large decrease in the reverse current in the ZnO/CuI diode by a reduced amount of oxygen vacancies. Therefore, the improvement of band alignment with the decrease in the interfacial defects by the introduction of wide bandgap ZnS passivation layer enhanced the electrical characteristics of ZnO/CuI diode.
|Journal||Applied Surface Science|
|Publication status||Published - 2021 Jan 15|
Bibliographical noteFunding Information:
This work was supported by the BK21 Plus Program (Globalization Program for Advanced Education of ChE-based Converging Technology, 21A20131812527) and the Basic Science Research Program (NRF-2016R1D1A1B03936347) through the National Research Foundation of Korea (NRF) funded by the Korean Government Ministry of Education . S. Li and C.-H. Chang acknowledge support from the Walmart U.S. Manufacturing Innovation Fund .
© 2020 Elsevier B.V.
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Surfaces and Interfaces