Interfacial reactions of Si/Co films on GaAs

J. S. Kwak; H. N. Kim; H. K. Baik; D. W. Shin; C. G. Park; C. S. Kim; S. K. Noh

doi:10.1007/BF00274555

Interfacial reactions of Si/Co films on GaAs

J. S. Kwak, H. N. Kim, H. K. Baik, D. W. Shin, C. G. Park, C. S. Kim, S. K. Noh

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	408-410
Number of pages	3
Journal	Journal of Materials Science Letters
Volume	14
Issue number	6
DOIs	https://doi.org/10.1007/BF00274555
Publication status	Published - 1995 Jan

All Science Journal Classification (ASJC) codes

Materials Science(all)

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10.1007/BF00274555

Cite this

@article{4cc9d3a211144ad3b2c129f1649fa3c5,

title = "Interfacial reactions of Si/Co films on GaAs",

author = "Kwak, {J. S.} and Kim, {H. N.} and Baik, {H. K.} and Shin, {D. W.} and Park, {C. G.} and Kim, {C. S.} and Noh, {S. K.}",

year = "1995",

month = jan,

doi = "10.1007/BF00274555",

language = "English",

volume = "14",

pages = "408--410",

journal = "Journal of Materials Science Letters",

issn = "0261-8028",

publisher = "Chapman & Hall",

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T1 - Interfacial reactions of Si/Co films on GaAs

AU - Kwak, J. S.

AU - Kim, H. N.

AU - Baik, H. K.

AU - Shin, D. W.

AU - Park, C. G.

AU - Kim, C. S.

AU - Noh, S. K.

PY - 1995/1

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U2 - 10.1007/BF00274555

DO - 10.1007/BF00274555

M3 - Article

AN - SCOPUS:0029272092

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VL - 14

SP - 408

EP - 410

JO - Journal of Materials Science Letters

JF - Journal of Materials Science Letters

IS - 6

ER -

Interfacial reactions of Si/Co films on GaAs

All Science Journal Classification (ASJC) codes

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