Instability of Polystyrene Film and Thermal Behaviors Mediated by Unfavorable Silicon Oxide Interlayer

Seungjae Lee, Wooseop Lee, Norifumi L. Yamada, Keiji Tanaka, Jong Hak Kim, Hoyeon Lee, Du Yeol Ryu

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)


Instability, glass transition temperature (Tg), and thermal expansion of polystyrene (PS) films are evaluated with respect to the thickness of a silicon oxide (SiOx) interlayer that mediates favorable long-range interaction from the non-oxide Si substrate. Taking into account that a SiOx interlayer is less favorable with an overlying PS film, we designed a systematic set of H-passivated (H-Si), native SiOx (N-Si), and non-native SiOx interlayer (P-Si) substrates. Here, P-Si denotes a substrate prepared by a plasma surface activation with oxygen to create an effective minimum SiOx thickness (∼9 nm) that is sufficient for the instability of PS films. The wetting-dewetting behavior differs in 100 and 43 kg/mol PS films supported on the three different substrates. Reflected in Tg and thermal expansion coefficient at the rubbery state for the overlying PS films, P-Si is found to be enough to promote the nontrivial instability of the films, leading to a marked decrease in Tg and increase in αr with decreasing film thickness (more than those on N-Si). Our results demonstrate the ability to use P-Si to effectively modulate favorable long-range interaction from the Si substrate better than a typical N-Si does.

Original languageEnglish
Pages (from-to)7524-7530
Number of pages7
Issue number19
Publication statusPublished - 2019 Oct 8

Bibliographical note

Publisher Copyright:
© 2019 American Chemical Society.

All Science Journal Classification (ASJC) codes

  • Organic Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry
  • Materials Chemistry


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