Initial Growth Characteristics of Gold Thin Films by a Nozzle Beam and Ion-Assisted Deposition

Seok Kyun Song; Seok Keun Koh; Deuk Yeon Lee; Hong Koo Baik

doi:10.1143/JJAP.43.L15

Initial Growth Characteristics of Gold Thin Films by a Nozzle Beam and Ion-Assisted Deposition

Seok Kyun Song, Seok Keun Koh, Deuk Yeon Lee, Hong Koo Baik

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

The electrical conductance characteristics due to tunneling of Au films on glass substrates as a function of deposition rate and Ar⁺ ion current density have been investigated by in situ measurement. The onset thickness for conductance was 8.5-29 Å lower than that obtained by other researchers due to the use of a nozzle beam in this study. The degree of agglomeration, t, attained its maximum value at a deposition rate R = 1.0 Å/s. The degree of coalescence increased with increasing deposition rate. The onset thickness for conductance decreased to a nearly linear line with increasing ion beam irradiation.

Original language	English
Pages (from-to)	L15-L17
Journal	Japanese Journal of Applied Physics
Volume	43
Issue number	1 A/B
DOIs	https://doi.org/10.1143/JJAP.43.L15
Publication status	Published - 2004 Jan 15

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

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title = "Initial Growth Characteristics of Gold Thin Films by a Nozzle Beam and Ion-Assisted Deposition",

abstract = "The electrical conductance characteristics due to tunneling of Au films on glass substrates as a function of deposition rate and Ar+ ion current density have been investigated by in situ measurement. The onset thickness for conductance was 8.5-29 {\AA} lower than that obtained by other researchers due to the use of a nozzle beam in this study. The degree of agglomeration, t, attained its maximum value at a deposition rate R = 1.0 {\AA}/s. The degree of coalescence increased with increasing deposition rate. The onset thickness for conductance decreased to a nearly linear line with increasing ion beam irradiation.",

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AU - Song, Seok Kyun

AU - Koh, Seok Keun

AU - Lee, Deuk Yeon

AU - Baik, Hong Koo

PY - 2004/1/15

Y1 - 2004/1/15

N2 - The electrical conductance characteristics due to tunneling of Au films on glass substrates as a function of deposition rate and Ar+ ion current density have been investigated by in situ measurement. The onset thickness for conductance was 8.5-29 Å lower than that obtained by other researchers due to the use of a nozzle beam in this study. The degree of agglomeration, t, attained its maximum value at a deposition rate R = 1.0 Å/s. The degree of coalescence increased with increasing deposition rate. The onset thickness for conductance decreased to a nearly linear line with increasing ion beam irradiation.

AB - The electrical conductance characteristics due to tunneling of Au films on glass substrates as a function of deposition rate and Ar+ ion current density have been investigated by in situ measurement. The onset thickness for conductance was 8.5-29 Å lower than that obtained by other researchers due to the use of a nozzle beam in this study. The degree of agglomeration, t, attained its maximum value at a deposition rate R = 1.0 Å/s. The degree of coalescence increased with increasing deposition rate. The onset thickness for conductance decreased to a nearly linear line with increasing ion beam irradiation.

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JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 1 A/B

ER -

Initial Growth Characteristics of Gold Thin Films by a Nozzle Beam and Ion-Assisted Deposition

Abstract

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