GaN nanowires and InGaN disk heterostructures are grown on an amorphous SiO2 layer by a plasma-assisted molecular beam epitaxy. Structural studies using scanning electron microscopy and high-resolution transmission electron microscopy reveal that the nanowires grow vertically without any extended defect similarly to nanowires grown on Si. The asgrown nanowires have an intermediate region consisting of Ga, O, and Si rather than SiNx at the interface between the nanowires and SiO2. The measured photoluminescence shows a variation of peak wavelengths ranging from 580 nm to 635 nm because of non-uniform indium incorporation. The nanowires grown on SiO2 are successfully transferred to a flexible polyimide sheet by Au-welding and epitaxial lift-off processes. The light-emitting diodes fabricated with the transferred nanowires are characterized by a turn-on voltage of approximately 4 V. The smaller turnon voltage in contrast to those of conventional nanowire light-emitting diodes is due to the absence of an intermediate layer, which is removed during an epitaxial lift-off process. The measured electroluminescence shows peak wavelengths of 610-616 nm with linewidths of 116-123 nm.
Bibliographical notePublisher Copyright:
© 2015 Optical Society of America.
All Science Journal Classification (ASJC) codes
- Atomic and Molecular Physics, and Optics