Influence of oxide thinning by selective etching process on solution processed indium zinc oxide thin film transistor

Jae Won Na; Hee Jun Kim; Jin Hyeok Lee; Hyun Jae Kim

doi:10.1002/sdtp.10859

Influence of oxide thinning by selective etching process on solution processed indium zinc oxide thin film transistor

Jae Won Na, Hee Jun Kim, Jin Hyeok Lee, Hyun Jae Kim

Department of Electrical and Electronic Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

Conductive indium zinc oxide (IZO) film was fabricated using solution process. After source/drain deposition on the IZO film, we immersed the IZO thin film transistor (TFT) into acetic acid solution to selectively etch the area between source and drain. By this selective etching, the IZO TFT showed proper transfer characteristics.

Original language	English
Pages (from-to)	1165-1167
Number of pages	3
Journal	Digest of Technical Papers - SID International Symposium
Volume	47
Issue number	1
DOIs	https://doi.org/10.1002/sdtp.10859
Publication status	Published - 2016
Event	54th Annual SID Symposium, Seminar, and Exhibition 2016, Display Week 2016 - San Francisco, United States Duration: 2016 May 22 → 2016 May 27

Bibliographical note

Funding Information:
This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIP) (No. 2011-0028819).

Publisher Copyright:
© (2016) by SID-the Society for Information Display. All rights reserved.

All Science Journal Classification (ASJC) codes

Engineering(all)

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10.1002/sdtp.10859

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title = "Influence of oxide thinning by selective etching process on solution processed indium zinc oxide thin film transistor",

abstract = "Conductive indium zinc oxide (IZO) film was fabricated using solution process. After source/drain deposition on the IZO film, we immersed the IZO thin film transistor (TFT) into acetic acid solution to selectively etch the area between source and drain. By this selective etching, the IZO TFT showed proper transfer characteristics.",

author = "Na, {Jae Won} and Kim, {Hee Jun} and Lee, {Jin Hyeok} and Kim, {Hyun Jae}",

note = "Funding Information: This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIP) (No. 2011-0028819). Publisher Copyright: {\textcopyright} (2016) by SID-the Society for Information Display. All rights reserved.; 54th Annual SID Symposium, Seminar, and Exhibition 2016, Display Week 2016 ; Conference date: 22-05-2016 Through 27-05-2016",

year = "2016",

doi = "10.1002/sdtp.10859",

language = "English",

volume = "47",

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journal = "Digest of Technical Papers - SID International Symposium",

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T1 - Influence of oxide thinning by selective etching process on solution processed indium zinc oxide thin film transistor

AU - Na, Jae Won

AU - Kim, Hee Jun

AU - Lee, Jin Hyeok

AU - Kim, Hyun Jae

N1 - Funding Information: This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIP) (No. 2011-0028819). Publisher Copyright: © (2016) by SID-the Society for Information Display. All rights reserved.

PY - 2016

Y1 - 2016

N2 - Conductive indium zinc oxide (IZO) film was fabricated using solution process. After source/drain deposition on the IZO film, we immersed the IZO thin film transistor (TFT) into acetic acid solution to selectively etch the area between source and drain. By this selective etching, the IZO TFT showed proper transfer characteristics.

AB - Conductive indium zinc oxide (IZO) film was fabricated using solution process. After source/drain deposition on the IZO film, we immersed the IZO thin film transistor (TFT) into acetic acid solution to selectively etch the area between source and drain. By this selective etching, the IZO TFT showed proper transfer characteristics.

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JO - Digest of Technical Papers - SID International Symposium

JF - Digest of Technical Papers - SID International Symposium

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T2 - 54th Annual SID Symposium, Seminar, and Exhibition 2016, Display Week 2016

Y2 - 22 May 2016 through 27 May 2016

ER -

Influence of oxide thinning by selective etching process on solution processed indium zinc oxide thin film transistor

Abstract

Bibliographical note

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