The thermal decompositions of trimethylgallium (TMG) and trimethylgallium-ammonia adduct (TMG:NH3) have been studied using Fourier transform infrared spectroscopy. A static cold-wall reactor is designed for use in the temperature range 25–1000 °C, and the gaseous reactants and products are in situ analyzed to obtain the kinetic information. TMG:NH3 as well as TMG is decomposed around 500 °C with liberation of the CH3 group. In the case of TMG:NH3, the CH3 group abstracts hydrogen from NH3, forming CH4. The decomposition of NH3 can be described as second-order kinetics, and that of TMG and TMG:NH3 as first-order kinetics. The decomposition rate constant of TMG:NH3 at 1.6 Torr is estimated to be log k1 = 15–63 (kcal/mol)/2.303RT.
|Number of pages||4|
|Journal||Chemistry of Materials|
|Publication status||Published - 1994 Mar 1|
All Science Journal Classification (ASJC) codes
- Chemical Engineering(all)
- Materials Chemistry