In-situ annealing study on the thermal stability of nickel germanides

Jae Wook Lee; Kyung Hwan Kwak; Hyoungsub Kim; Cheol Woong Yang; Dongwon Lee; Dae Hong Ko

doi:10.3938/jkps.50.677

In-situ annealing study on the thermal stability of nickel germanides

Jae Wook Lee, Kyung Hwan Kwak, Hyoungsub Kim, Cheol Woong Yang, Dongwon Lee, Dae Hong Ko

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

This study investigated the formation and the thermal stability of Ni germanides formed in Ni/Ge and Ni_0.9Ta_0.1/Ge systems. At temperatures above 550°C, the sheet resistance of the germanides in the Ni_0.9Ta_0.1/Ge system was lower than that in the Ni/Ge system. The microstructure of the phases formed by the reaction was examined by using analytical electron microscopy (AEM), and convergent beam electron diffraction (CBED) techniques were used to identify the phase of Ni germanide. In addition, in-situ annealing in transmission electron microscopy (TEM) was used to examine the formation and the morphological evolution of Ni germanides in the Ni/Ge and the Ni_0.9Ta_0.1/Ge systems as functions of temperature. The addition of Ta atoms inhibited the agglomeration of Ni germanide and improved the thermal stability of Ni germanide.

Original language	English
Pages (from-to)	677-680
Number of pages	4
Journal	Journal of the Korean Physical Society
Volume	50
Issue number	3
DOIs	https://doi.org/10.3938/jkps.50.677
Publication status	Published - 2007 Mar

All Science Journal Classification (ASJC) codes

Physics and Astronomy(all)

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10.3938/jkps.50.677

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title = "In-situ annealing study on the thermal stability of nickel germanides",

abstract = "This study investigated the formation and the thermal stability of Ni germanides formed in Ni/Ge and Ni0.9Ta0.1/Ge systems. At temperatures above 550°C, the sheet resistance of the germanides in the Ni0.9Ta0.1/Ge system was lower than that in the Ni/Ge system. The microstructure of the phases formed by the reaction was examined by using analytical electron microscopy (AEM), and convergent beam electron diffraction (CBED) techniques were used to identify the phase of Ni germanide. In addition, in-situ annealing in transmission electron microscopy (TEM) was used to examine the formation and the morphological evolution of Ni germanides in the Ni/Ge and the Ni0.9Ta0.1/Ge systems as functions of temperature. The addition of Ta atoms inhibited the agglomeration of Ni germanide and improved the thermal stability of Ni germanide.",

author = "Lee, {Jae Wook} and Kwak, {Kyung Hwan} and Hyoungsub Kim and Yang, {Cheol Woong} and Dongwon Lee and Ko, {Dae Hong}",

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AU - Lee, Jae Wook

AU - Kwak, Kyung Hwan

AU - Kim, Hyoungsub

AU - Yang, Cheol Woong

AU - Lee, Dongwon

AU - Ko, Dae Hong

PY - 2007/3

Y1 - 2007/3

N2 - This study investigated the formation and the thermal stability of Ni germanides formed in Ni/Ge and Ni0.9Ta0.1/Ge systems. At temperatures above 550°C, the sheet resistance of the germanides in the Ni0.9Ta0.1/Ge system was lower than that in the Ni/Ge system. The microstructure of the phases formed by the reaction was examined by using analytical electron microscopy (AEM), and convergent beam electron diffraction (CBED) techniques were used to identify the phase of Ni germanide. In addition, in-situ annealing in transmission electron microscopy (TEM) was used to examine the formation and the morphological evolution of Ni germanides in the Ni/Ge and the Ni0.9Ta0.1/Ge systems as functions of temperature. The addition of Ta atoms inhibited the agglomeration of Ni germanide and improved the thermal stability of Ni germanide.

AB - This study investigated the formation and the thermal stability of Ni germanides formed in Ni/Ge and Ni0.9Ta0.1/Ge systems. At temperatures above 550°C, the sheet resistance of the germanides in the Ni0.9Ta0.1/Ge system was lower than that in the Ni/Ge system. The microstructure of the phases formed by the reaction was examined by using analytical electron microscopy (AEM), and convergent beam electron diffraction (CBED) techniques were used to identify the phase of Ni germanide. In addition, in-situ annealing in transmission electron microscopy (TEM) was used to examine the formation and the morphological evolution of Ni germanides in the Ni/Ge and the Ni0.9Ta0.1/Ge systems as functions of temperature. The addition of Ta atoms inhibited the agglomeration of Ni germanide and improved the thermal stability of Ni germanide.

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JO - Journal of the Korean Physical Society

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In-situ annealing study on the thermal stability of nickel germanides

Abstract

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