Improvement in current density of nano- and micro-structured Si solar cells by cost-effective elastomeric stamp process

Kiseok Jeon; Hongsub Jee; Sangwoo Lim; Min Joon Park; Chaehwan Jeong

doi:10.1063/1.5013298

Improvement in current density of nano- and micro-structured Si solar cells by cost-effective elastomeric stamp process

Kiseok Jeon, Hongsub Jee, Sangwoo Lim, Min Joon Park, Chaehwan Jeong

Department of Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

Effective incident light should be controlled for improving the current density of solar cells by employing nano- and micro-structures on silicon surface. The elastomeric stamp process, which is more cost effective and simpler than conventional photolithography, was proposed for the fabrication of nano- and micro-structures. Polydimethylsiloxane (PDMS) was poured on a mother pattern with a diameter of 6 μm and a spacing of 2 μm; then, curing was performed to create a PDMS mold. The regular micropattern was stamped on a low-viscosity resin-coated silicon surface, followed by the simple reactive ion etching process. Nano-structures were formed using the Ag-based electroless etching process. As etching time was increased to 6 min, reflectance decreased to 4.53% and current density improved from 22.35 to 34.72 mA/cm².

Original language	English
Article number	035203
Journal	AIP Advances
Volume	8
Issue number	3
DOIs	https://doi.org/10.1063/1.5013298
Publication status	Published - 2018 Mar 1

Bibliographical note

Funding Information:
This work was supported by the New & Renewable Energy Technology Development Program of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) grant funded by the Korean government Ministry of Knowledge Economy (20163030014070) and financially supported by the Project of the Korea Institute of Industrial Technology (KITECH-JG 170018).

Publisher Copyright:
© 2018 Author(s).

All Science Journal Classification (ASJC) codes

Physics and Astronomy(all)

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title = "Improvement in current density of nano- and micro-structured Si solar cells by cost-effective elastomeric stamp process",

abstract = "Effective incident light should be controlled for improving the current density of solar cells by employing nano- and micro-structures on silicon surface. The elastomeric stamp process, which is more cost effective and simpler than conventional photolithography, was proposed for the fabrication of nano- and micro-structures. Polydimethylsiloxane (PDMS) was poured on a mother pattern with a diameter of 6 μm and a spacing of 2 μm; then, curing was performed to create a PDMS mold. The regular micropattern was stamped on a low-viscosity resin-coated silicon surface, followed by the simple reactive ion etching process. Nano-structures were formed using the Ag-based electroless etching process. As etching time was increased to 6 min, reflectance decreased to 4.53% and current density improved from 22.35 to 34.72 mA/cm2.",

author = "Kiseok Jeon and Hongsub Jee and Sangwoo Lim and Park, {Min Joon} and Chaehwan Jeong",

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AU - Jeong, Chaehwan

N1 - Funding Information: This work was supported by the New & Renewable Energy Technology Development Program of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) grant funded by the Korean government Ministry of Knowledge Economy (20163030014070) and financially supported by the Project of the Korea Institute of Industrial Technology (KITECH-JG 170018). Publisher Copyright: © 2018 Author(s).

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N2 - Effective incident light should be controlled for improving the current density of solar cells by employing nano- and micro-structures on silicon surface. The elastomeric stamp process, which is more cost effective and simpler than conventional photolithography, was proposed for the fabrication of nano- and micro-structures. Polydimethylsiloxane (PDMS) was poured on a mother pattern with a diameter of 6 μm and a spacing of 2 μm; then, curing was performed to create a PDMS mold. The regular micropattern was stamped on a low-viscosity resin-coated silicon surface, followed by the simple reactive ion etching process. Nano-structures were formed using the Ag-based electroless etching process. As etching time was increased to 6 min, reflectance decreased to 4.53% and current density improved from 22.35 to 34.72 mA/cm2.

AB - Effective incident light should be controlled for improving the current density of solar cells by employing nano- and micro-structures on silicon surface. The elastomeric stamp process, which is more cost effective and simpler than conventional photolithography, was proposed for the fabrication of nano- and micro-structures. Polydimethylsiloxane (PDMS) was poured on a mother pattern with a diameter of 6 μm and a spacing of 2 μm; then, curing was performed to create a PDMS mold. The regular micropattern was stamped on a low-viscosity resin-coated silicon surface, followed by the simple reactive ion etching process. Nano-structures were formed using the Ag-based electroless etching process. As etching time was increased to 6 min, reflectance decreased to 4.53% and current density improved from 22.35 to 34.72 mA/cm2.

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Improvement in current density of nano- and micro-structured Si solar cells by cost-effective elastomeric stamp process

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