Hybrid nanofabrication processes utilizing diblock copolymer nanotemplate prepared by self-assembled monolayer based surface neutralization

Su Jin Kim; W. J. Maeng; S. K. Lee; D. H. Park; Sung Hwan Bang; Hyungjun Kim; Byeong Hyeok Sohn

doi:10.1116/1.2830693

Hybrid nanofabrication processes utilizing diblock copolymer nanotemplate prepared by self-assembled monolayer based surface neutralization

Su Jin Kim, W. J. Maeng, S. K. Lee, D. H. Park, Sung Hwan Bang, Hyungjun Kim, Byeong Hyeok Sohn

Department of Electrical and Electronic Engineering

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

Nanostructures including nanohole and metal dot arrays were fabricated by hybrid processes combing self-assembled diblock copolymer and conventional semiconductor processes. The interfacial energy between polystyrene- b -polymethylmetacrylate (PS- b -PMMA) diblock copolymer and substrate surface was controlled by employing a self-assembled monolayer (SAM), resulting in a polymer template with well-ordered cylindrical nanohole array. The nanohole sizes were controlled within 10 to 22 nm in diameter using block copolymers with different molecular weights. The PS nanotemplates were fabricated on various substrates, including oxides, nitrides, and poly-Si. Nanohole pattern was transferred by dry etching process, producing inorganic nanohole templates. Also, gold nanodot arrays with diameter smaller than 10 nm were fabricated through lift off process.

Original language	English
Pages (from-to)	189-194
Number of pages	6
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	26
Issue number	1
DOIs	https://doi.org/10.1116/1.2830693
Publication status	Published - 2008

Bibliographical note

Funding Information:
This work was supported by Korea Research Foundation (Basic Research Promotion Fund Grant No. KRF-2006-311-D00114 and MOEHRD Grant Nos. KRF-2005-005-J13102, KRF-2007-331-D00243), the Korea Science and Engineering Foundation (KOSEF) grant funded by the Korean government (MOST) (No. R01-2007-000-20143-0), Nano R&D Program through the Korea Science and Engineering Foundation funded by the Ministry of Science & Technology (Grant No. 2007-02864), and POSTECH Core Research Program. The authors gratefully acknowledge the financial support of the System IC 2010 Program, Korea Electronic Tchnology Institute, and thank J. W. Park in POSTECH for help in contact angle measurements. S.J.K. and W.J.M. were financially supported by the second stage of the Brain Korea 21 Project in 2007.

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.2830693

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Kim, S. J., Maeng, W. J., Lee, S. K., Park, D. H., Bang, S. H., Kim, H., & Sohn, B. H. (2008). Hybrid nanofabrication processes utilizing diblock copolymer nanotemplate prepared by self-assembled monolayer based surface neutralization. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 26(1), 189-194. https://doi.org/10.1116/1.2830693

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title = "Hybrid nanofabrication processes utilizing diblock copolymer nanotemplate prepared by self-assembled monolayer based surface neutralization",

abstract = "Nanostructures including nanohole and metal dot arrays were fabricated by hybrid processes combing self-assembled diblock copolymer and conventional semiconductor processes. The interfacial energy between polystyrene- b -polymethylmetacrylate (PS- b -PMMA) diblock copolymer and substrate surface was controlled by employing a self-assembled monolayer (SAM), resulting in a polymer template with well-ordered cylindrical nanohole array. The nanohole sizes were controlled within 10 to 22 nm in diameter using block copolymers with different molecular weights. The PS nanotemplates were fabricated on various substrates, including oxides, nitrides, and poly-Si. Nanohole pattern was transferred by dry etching process, producing inorganic nanohole templates. Also, gold nanodot arrays with diameter smaller than 10 nm were fabricated through lift off process.",

author = "Kim, {Su Jin} and Maeng, {W. J.} and Lee, {S. K.} and Park, {D. H.} and Bang, {Sung Hwan} and Hyungjun Kim and Sohn, {Byeong Hyeok}",

note = "Funding Information: This work was supported by Korea Research Foundation (Basic Research Promotion Fund Grant No. KRF-2006-311-D00114 and MOEHRD Grant Nos. KRF-2005-005-J13102, KRF-2007-331-D00243), the Korea Science and Engineering Foundation (KOSEF) grant funded by the Korean government (MOST) (No. R01-2007-000-20143-0), Nano R&D Program through the Korea Science and Engineering Foundation funded by the Ministry of Science & Technology (Grant No. 2007-02864), and POSTECH Core Research Program. The authors gratefully acknowledge the financial support of the System IC 2010 Program, Korea Electronic Tchnology Institute, and thank J. W. Park in POSTECH for help in contact angle measurements. S.J.K. and W.J.M. were financially supported by the second stage of the Brain Korea 21 Project in 2007.",

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doi = "10.1116/1.2830693",

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Hybrid nanofabrication processes utilizing diblock copolymer nanotemplate prepared by self-assembled monolayer based surface neutralization. / Kim, Su Jin; Maeng, W. J.; Lee, S. K. et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 26, No. 1, 2008, p. 189-194.

Research output: Contribution to journal › Article › peer-review

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AU - Bang, Sung Hwan

AU - Kim, Hyungjun

AU - Sohn, Byeong Hyeok

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N2 - Nanostructures including nanohole and metal dot arrays were fabricated by hybrid processes combing self-assembled diblock copolymer and conventional semiconductor processes. The interfacial energy between polystyrene- b -polymethylmetacrylate (PS- b -PMMA) diblock copolymer and substrate surface was controlled by employing a self-assembled monolayer (SAM), resulting in a polymer template with well-ordered cylindrical nanohole array. The nanohole sizes were controlled within 10 to 22 nm in diameter using block copolymers with different molecular weights. The PS nanotemplates were fabricated on various substrates, including oxides, nitrides, and poly-Si. Nanohole pattern was transferred by dry etching process, producing inorganic nanohole templates. Also, gold nanodot arrays with diameter smaller than 10 nm were fabricated through lift off process.

AB - Nanostructures including nanohole and metal dot arrays were fabricated by hybrid processes combing self-assembled diblock copolymer and conventional semiconductor processes. The interfacial energy between polystyrene- b -polymethylmetacrylate (PS- b -PMMA) diblock copolymer and substrate surface was controlled by employing a self-assembled monolayer (SAM), resulting in a polymer template with well-ordered cylindrical nanohole array. The nanohole sizes were controlled within 10 to 22 nm in diameter using block copolymers with different molecular weights. The PS nanotemplates were fabricated on various substrates, including oxides, nitrides, and poly-Si. Nanohole pattern was transferred by dry etching process, producing inorganic nanohole templates. Also, gold nanodot arrays with diameter smaller than 10 nm were fabricated through lift off process.

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Hybrid nanofabrication processes utilizing diblock copolymer nanotemplate prepared by self-assembled monolayer based surface neutralization

Abstract

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