High-speed plasmonic nanolithography with a solid immersion lens-based plasmonic optical head

Taeseob Kim; Won Sup Lee; Hang Eun Joe; Geon Lim; Guk Jong Choi; Myeong Gu Gang; Sung Mook Kang; Kyoung Su Park; Byung Kwon Min; Young Pil Park; No Cheol Park

doi:10.1063/1.4760263

High-speed plasmonic nanolithography with a solid immersion lens-based plasmonic optical head

Taeseob Kim, Won Sup Lee, Hang Eun Joe, Geon Lim, Guk Jong Choi, Myeong Gu Gang, Sung Mook Kang, Kyoung Su Park, Byung Kwon Min, Young Pil Park, No Cheol Park

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

This letter describes the use of a plasmonic optical head to achieve high-speed nanopatterning. A plasmonic optical head employs both a sharp-ridged nanoaperture and a nanogap control to maintain the nanogap required for near-field nanolithography. The nanogap control uses a gap error signal produced by evanescent coupling through the air-gap. We demonstrate that a plasmonic optical head achieves a patterning resolution of 70 nm and a patterning speed of 100 mm/s. The proposed combination of a surface plasmon nanoaperture and a nanogap servo system is one of the strategies used to achieve high-speed, high-resolution nanolithography.

Original language	English
Article number	161109
Journal	Applied Physics Letters
Volume	101
Issue number	16
DOIs	https://doi.org/10.1063/1.4760263
Publication status	Published - 2012 Oct 15

Bibliographical note

Funding Information:
This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MEST) (No. 2011-0027571) and (No. 2012-0001013).

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.4760263

Cite this

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abstract = "This letter describes the use of a plasmonic optical head to achieve high-speed nanopatterning. A plasmonic optical head employs both a sharp-ridged nanoaperture and a nanogap control to maintain the nanogap required for near-field nanolithography. The nanogap control uses a gap error signal produced by evanescent coupling through the air-gap. We demonstrate that a plasmonic optical head achieves a patterning resolution of 70 nm and a patterning speed of 100 mm/s. The proposed combination of a surface plasmon nanoaperture and a nanogap servo system is one of the strategies used to achieve high-speed, high-resolution nanolithography.",

author = "Taeseob Kim and Lee, {Won Sup} and Joe, {Hang Eun} and Geon Lim and Choi, {Guk Jong} and Gang, {Myeong Gu} and Kang, {Sung Mook} and Park, {Kyoung Su} and Min, {Byung Kwon} and Park, {Young Pil} and Park, {No Cheol}",

note = "Funding Information: This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MEST) (No. 2011-0027571) and (No. 2012-0001013).",

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doi = "10.1063/1.4760263",

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AU - Kim, Taeseob

AU - Lee, Won Sup

AU - Joe, Hang Eun

AU - Lim, Geon

AU - Choi, Guk Jong

AU - Gang, Myeong Gu

AU - Kang, Sung Mook

AU - Park, Kyoung Su

AU - Min, Byung Kwon

AU - Park, Young Pil

AU - Park, No Cheol

N1 - Funding Information: This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MEST) (No. 2011-0027571) and (No. 2012-0001013).

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N2 - This letter describes the use of a plasmonic optical head to achieve high-speed nanopatterning. A plasmonic optical head employs both a sharp-ridged nanoaperture and a nanogap control to maintain the nanogap required for near-field nanolithography. The nanogap control uses a gap error signal produced by evanescent coupling through the air-gap. We demonstrate that a plasmonic optical head achieves a patterning resolution of 70 nm and a patterning speed of 100 mm/s. The proposed combination of a surface plasmon nanoaperture and a nanogap servo system is one of the strategies used to achieve high-speed, high-resolution nanolithography.

AB - This letter describes the use of a plasmonic optical head to achieve high-speed nanopatterning. A plasmonic optical head employs both a sharp-ridged nanoaperture and a nanogap control to maintain the nanogap required for near-field nanolithography. The nanogap control uses a gap error signal produced by evanescent coupling through the air-gap. We demonstrate that a plasmonic optical head achieves a patterning resolution of 70 nm and a patterning speed of 100 mm/s. The proposed combination of a surface plasmon nanoaperture and a nanogap servo system is one of the strategies used to achieve high-speed, high-resolution nanolithography.

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High-speed plasmonic nanolithography with a solid immersion lens-based plasmonic optical head

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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