Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors

Yujin Lee, Seunggi Seo, Taewook Nam, Hyunho Lee, Hwi Yoon, Sangkyu Sun, Il Kwon Oh, Sanghun Lee, Bonggeun Shong, Jin Hyung Seo, Jang Hyeon Seok, Hyungjun Kim

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