Alumina (Al 2O 3) nanostructures were grown in a horizontal Al 2O 3 tube furnace by chemical vapor deposition (CVD) using an aluminum (Al) powder source without catalysts at temperatures ranging from 1100 to 1400 °C and pressures ranging from 0.01 to 53.32 kPa. As the temperature and pressure were increased, the nanostructure size increased and in particular, increasing pressure resulted in various changes in morphology. Here we present a morphology diagram of the one-dimensional Al 2O 3 nanostructure growth to illustrate different growth features at various temperatures and pressures. Moreover, we suggest that the Al 2O 3 nanostructure deposition mechanism was affected by the liquid source droplet and film morphology as the temperature and pressure changed in the absence of catalysts.
|Number of pages||6|
|Journal||Journal of Crystal Growth|
|Publication status||Published - 2012 Dec 15|
Bibliographical noteFunding Information:
This work was supported by DAPA and ADD, Republic of Korea .
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Inorganic Chemistry
- Materials Chemistry