Because the direct formation of large, patterned graphene layers on active electronic devices without any physical transfer process is an ultimate important research goal for practical applications, we first developed a cost-effective, scalable, and sustainable process to form graphene films from solution-processed common polymers directly on a SiO2/Si substrate. We obtained few-layer graphene by heating the thin polymer films covered with a metal capping layer in a high-temperature furnace under low vacuum in an Ar/H2 atmosphere. We find that the metal capping layer appears to have two functions: prevention of vaporization of dissociated molecules and catalysis of graphene formation. We suggest that polymer-derived graphene growth directly on inert substrates in active electronic devices will have great advantages because of its simple, inexpensive, and safer process.
All Science Journal Classification (ASJC) codes
- General Materials Science
- Physical and Theoretical Chemistry