Facile fabrication of sub-20-nm nanochannels based on crystallinity- dependent anisotropic etching of silicon

Youngsup Song; Min Ook Kim; Dae Sung Kwon; Yong Jun Kim; Jongbaeg Kim

doi:10.1016/j.mee.2012.07.100

Facile fabrication of sub-20-nm nanochannels based on crystallinity- dependent anisotropic etching of silicon

Youngsup Song, Min Ook Kim, Dae Sung Kwon, Yong Jun Kim, Jongbaeg Kim

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

We developed a novel method to fabricate nanochannels with simple and facile process utilizing the crystallinity-dependent anisotropic wet etching of silicon. The nanochannels were formed in bulk (1 1 1)-oriented single-crystalline silicon wafer by single step of microscale lithography and sealed by thin film deposition. Hence the massively parallel and wafer scale nanochannel fabrication was easily achieved without the necessity of nanolithography or complicated process. The dimension of the fabricated nanochannels was down to 16 nm in depth and 175 nm in width, and up to 8 cm in length.

Original language	English
Pages (from-to)	309-312
Number of pages	4
Journal	Microelectronic Engineering
Volume	98
DOIs	https://doi.org/10.1016/j.mee.2012.07.100
Publication status	Published - 2012 Oct

Bibliographical note

Funding Information:
This research was supported by Basic Science Research Program (2011-0002585), the Fusion Research Program for Green Technologies (2011-0000005) through the National Research Foundation of Korea (NRF), the Converging Research Center Program (2011K000756) funded by the Ministry of Education, Science and Technology, and Korea Ministry of Environment as “Converging technology project”.

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/j.mee.2012.07.100

Cite this

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title = "Facile fabrication of sub-20-nm nanochannels based on crystallinity- dependent anisotropic etching of silicon",

abstract = "We developed a novel method to fabricate nanochannels with simple and facile process utilizing the crystallinity-dependent anisotropic wet etching of silicon. The nanochannels were formed in bulk (1 1 1)-oriented single-crystalline silicon wafer by single step of microscale lithography and sealed by thin film deposition. Hence the massively parallel and wafer scale nanochannel fabrication was easily achieved without the necessity of nanolithography or complicated process. The dimension of the fabricated nanochannels was down to 16 nm in depth and 175 nm in width, and up to 8 cm in length.",

author = "Youngsup Song and Kim, {Min Ook} and Kwon, {Dae Sung} and Kim, {Yong Jun} and Jongbaeg Kim",

note = "Funding Information: This research was supported by Basic Science Research Program (2011-0002585), the Fusion Research Program for Green Technologies (2011-0000005) through the National Research Foundation of Korea (NRF), the Converging Research Center Program (2011K000756) funded by the Ministry of Education, Science and Technology, and Korea Ministry of Environment as “Converging technology project”.",

year = "2012",

month = oct,

doi = "10.1016/j.mee.2012.07.100",

language = "English",

volume = "98",

pages = "309--312",

journal = "Microelectronic Engineering",

issn = "0167-9317",

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AU - Song, Youngsup

AU - Kim, Min Ook

AU - Kwon, Dae Sung

AU - Kim, Yong Jun

AU - Kim, Jongbaeg

N1 - Funding Information: This research was supported by Basic Science Research Program (2011-0002585), the Fusion Research Program for Green Technologies (2011-0000005) through the National Research Foundation of Korea (NRF), the Converging Research Center Program (2011K000756) funded by the Ministry of Education, Science and Technology, and Korea Ministry of Environment as “Converging technology project”.

PY - 2012/10

Y1 - 2012/10

N2 - We developed a novel method to fabricate nanochannels with simple and facile process utilizing the crystallinity-dependent anisotropic wet etching of silicon. The nanochannels were formed in bulk (1 1 1)-oriented single-crystalline silicon wafer by single step of microscale lithography and sealed by thin film deposition. Hence the massively parallel and wafer scale nanochannel fabrication was easily achieved without the necessity of nanolithography or complicated process. The dimension of the fabricated nanochannels was down to 16 nm in depth and 175 nm in width, and up to 8 cm in length.

AB - We developed a novel method to fabricate nanochannels with simple and facile process utilizing the crystallinity-dependent anisotropic wet etching of silicon. The nanochannels were formed in bulk (1 1 1)-oriented single-crystalline silicon wafer by single step of microscale lithography and sealed by thin film deposition. Hence the massively parallel and wafer scale nanochannel fabrication was easily achieved without the necessity of nanolithography or complicated process. The dimension of the fabricated nanochannels was down to 16 nm in depth and 175 nm in width, and up to 8 cm in length.

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DO - 10.1016/j.mee.2012.07.100

M3 - Article

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VL - 98

SP - 309

EP - 312

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -

Facile fabrication of sub-20-nm nanochannels based on crystallinity- dependent anisotropic etching of silicon

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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