Fabrication of UV detectors based on ZnO nanowires using silicon microchannel

J. P. Kar; S. N. Das; J. H. Choi; Y. A. Lee; T. Y. Lee; J. M. Myoung

doi:10.1016/j.jcrysgro.2009.04.005

Fabrication of UV detectors based on ZnO nanowires using silicon microchannel

J. P. Kar, S. N. Das, J. H. Choi, Y. A. Lee, T. Y. Lee, J. M. Myoung

Research output: Contribution to journal › Article › peer-review

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Abstract

Aligned ZnO nanowires were grown by metal organic chemical vapor deposition on patterned silicon substrate. The shape of nanostructures was greatly influenced by the micropatterned surface. The aspect ratio, packing fraction and the number density of nanowires on top surface are around 10, 0.8 and 10⁷ per mm², respectively, whereas the values are 20, 0.3 and 5×10⁷ per mm², respectively, towards the bottom of the cavity. XRD patterns suggest that the nanostructures have good crystallinity. High-resolution transmission electron microscopy confirmed the single-crystalline growth of the ZnO nanowires along the [0 0 0 1] direction. Photosensitivity of the nanowires, grown on both top and bottom surface of the microchannel, was observed. However, the nanowires grown on bottom surface have shown better UV response with base line recovery at dark condition.

Original language	English
Pages (from-to)	3305-3309
Number of pages	5
Journal	Journal of Crystal Growth
Volume	311
Issue number	12
DOIs	https://doi.org/10.1016/j.jcrysgro.2009.04.005
Publication status	Published - 2009 Jun 1

Bibliographical note

Funding Information:
This work was supported by the IT R&D program of MKE/IITA (2008-F-023-01, Next generation future device fabricated by using nano junction) and the academic–industrial cooperation program funded by Samsung Electronics Co., Ltd. (2008-8-2105). Y.A. Lee and T.Y. Lee were supported by System IC 2010 program of the Ministry of knowledge economy, Republic of Korea (10030517-2008-02, Advanced CMOS image sensor using 3D integration).

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Inorganic Chemistry
Materials Chemistry

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10.1016/j.jcrysgro.2009.04.005

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title = "Fabrication of UV detectors based on ZnO nanowires using silicon microchannel",

abstract = "Aligned ZnO nanowires were grown by metal organic chemical vapor deposition on patterned silicon substrate. The shape of nanostructures was greatly influenced by the micropatterned surface. The aspect ratio, packing fraction and the number density of nanowires on top surface are around 10, 0.8 and 107 per mm2, respectively, whereas the values are 20, 0.3 and 5×107 per mm2, respectively, towards the bottom of the cavity. XRD patterns suggest that the nanostructures have good crystallinity. High-resolution transmission electron microscopy confirmed the single-crystalline growth of the ZnO nanowires along the [0 0 0 1] direction. Photosensitivity of the nanowires, grown on both top and bottom surface of the microchannel, was observed. However, the nanowires grown on bottom surface have shown better UV response with base line recovery at dark condition.",

author = "Kar, {J. P.} and Das, {S. N.} and Choi, {J. H.} and Lee, {Y. A.} and Lee, {T. Y.} and Myoung, {J. M.}",

note = "Funding Information: This work was supported by the IT R&D program of MKE/IITA (2008-F-023-01, Next generation future device fabricated by using nano junction) and the academic–industrial cooperation program funded by Samsung Electronics Co., Ltd. (2008-8-2105). Y.A. Lee and T.Y. Lee were supported by System IC 2010 program of the Ministry of knowledge economy, Republic of Korea (10030517-2008-02, Advanced CMOS image sensor using 3D integration).",

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doi = "10.1016/j.jcrysgro.2009.04.005",

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AU - Das, S. N.

AU - Choi, J. H.

AU - Lee, Y. A.

AU - Lee, T. Y.

AU - Myoung, J. M.

N1 - Funding Information: This work was supported by the IT R&D program of MKE/IITA (2008-F-023-01, Next generation future device fabricated by using nano junction) and the academic–industrial cooperation program funded by Samsung Electronics Co., Ltd. (2008-8-2105). Y.A. Lee and T.Y. Lee were supported by System IC 2010 program of the Ministry of knowledge economy, Republic of Korea (10030517-2008-02, Advanced CMOS image sensor using 3D integration).

PY - 2009/6/1

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N2 - Aligned ZnO nanowires were grown by metal organic chemical vapor deposition on patterned silicon substrate. The shape of nanostructures was greatly influenced by the micropatterned surface. The aspect ratio, packing fraction and the number density of nanowires on top surface are around 10, 0.8 and 107 per mm2, respectively, whereas the values are 20, 0.3 and 5×107 per mm2, respectively, towards the bottom of the cavity. XRD patterns suggest that the nanostructures have good crystallinity. High-resolution transmission electron microscopy confirmed the single-crystalline growth of the ZnO nanowires along the [0 0 0 1] direction. Photosensitivity of the nanowires, grown on both top and bottom surface of the microchannel, was observed. However, the nanowires grown on bottom surface have shown better UV response with base line recovery at dark condition.

AB - Aligned ZnO nanowires were grown by metal organic chemical vapor deposition on patterned silicon substrate. The shape of nanostructures was greatly influenced by the micropatterned surface. The aspect ratio, packing fraction and the number density of nanowires on top surface are around 10, 0.8 and 107 per mm2, respectively, whereas the values are 20, 0.3 and 5×107 per mm2, respectively, towards the bottom of the cavity. XRD patterns suggest that the nanostructures have good crystallinity. High-resolution transmission electron microscopy confirmed the single-crystalline growth of the ZnO nanowires along the [0 0 0 1] direction. Photosensitivity of the nanowires, grown on both top and bottom surface of the microchannel, was observed. However, the nanowires grown on bottom surface have shown better UV response with base line recovery at dark condition.

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Fabrication of UV detectors based on ZnO nanowires using silicon microchannel

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