Abstract
We report the solution processed polycrystalline InGaZnO thin film transistor. The films with molar ratio of In, Ga, and Zn (1: 1: 2) were deposited by spin coating, and the device exhibits an on-to-off current ratio of ̃1.88×105 and field effect mobility of ̃0.96 cm 2/Vs, respectively.
Original language | English |
---|---|
Pages (from-to) | 1258-1261 |
Number of pages | 4 |
Journal | Digest of Technical Papers - SID International Symposium |
Volume | 39 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2008 |
Event | 2008 SID International Symposium - Los Angeles, CA, United States Duration: 2008 May 20 → 2008 May 21 |
All Science Journal Classification (ASJC) codes
- Engineering(all)