Abstract
This work shows an oxide-based phototransistor that senses visible light by creating highly defective interfaces (HDIs). HDIs are fabricated by using nanowires of hafnium oxide (HfO2) and titanium dioxide (TiO2) embedded in indium gallium zinc oxide (IGZO). It sensed red light with photo responsivity of 178.7 A/W and a signal-to-noise ratio of 105.
Original language | English |
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Pages (from-to) | 1260-1263 |
Number of pages | 4 |
Journal | Digest of Technical Papers - SID International Symposium |
Volume | 49 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2018 |
Event | SID Symposium, Seminar, and Exhibition 2018, Display Week 2018 - Los Angeles, United States Duration: 2018 May 20 → 2018 May 25 |
Bibliographical note
Funding Information:This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korean government (MSIT) (No. 2017R1A2B3008719).
Publisher Copyright:
© 2018, Blackwell Publishing Ltd. All rights reserved.
All Science Journal Classification (ASJC) codes
- Engineering(all)