Recently, demands for nanochannels have been increasing in biological and nanofluidic applications. In this paper, a fabrication process that produces a nanochannel with a width of less than 20 nm and a high aspect ratio is proposed. For the versatility of channel pattern design, focused ion beam (FIB) direct writing is applied for mask fabrication. A metal mask pattern is fabricated using localized ion implantation method and is used for a deep reactive ion etching (DRIE) process. A process condition for minimum undercut in the DRIE process is determined. The proposed method is applied to the fabrication of nanochannels with various dimension and patterns.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)