Fabrication of monodisperse asymmetric colloidal clusters by using Contact Area Lithography (CAL)

Changdeuck Bae, Jooho Moon, Hyunjung Shin, Jiyoung Kim, Myung M. Sung

Research output: Contribution to journalArticlepeer-review

43 Citations (Scopus)


We report a new fabrication method of asymmetric colloidal clusters by using contact area lithography with site-selective growth. Nanometric surface patterns (∼44, 60, and 81 nm in diameter) were prepared by coating surfaces with self-assembled monolayers (SAMs; octadecyltrichlorosilane (OTS) in this study) except the contact area either between colloidal particles or between colloids and substrate. Nanoscale site-specific heterogeneous nucleation and growth of oxide materials of titanium were studied using the patterns of OTS-SAMs onto the either flat or curved surfaces of SiO2. Experimental results suggest that a combination of the large difference in the surface energy between the growing and surrounding surfaces and the diffusion-controlled growth leads to complete nanoscale site specificity. We also fabricated superstructrures of silica spheres with hemispheres of titania (<20 nm in dimension) on their surfaces and discussed the optical properties of colloidal films consisting of the monodisperse asymmetric colloidal clusters in terms of photonic band gap.

Original languageEnglish
Pages (from-to)14232-14239
Number of pages8
JournalJournal of the American Chemical Society
Issue number46
Publication statusPublished - 2007 Nov 21

All Science Journal Classification (ASJC) codes

  • Catalysis
  • Chemistry(all)
  • Biochemistry
  • Colloid and Surface Chemistry


Dive into the research topics of 'Fabrication of monodisperse asymmetric colloidal clusters by using Contact Area Lithography (CAL)'. Together they form a unique fingerprint.

Cite this