Fabrication of diffractive optical elements with grayscale photo-lithography

Wan Chin Kim, Myung Bok Lee, Jin Seung Sohn, Eun Hyung Cho, Chan Young Yoon, No Cheol Park, Young Pil Park

Research output: Contribution to journalConference articlepeer-review


We have developed diffractive optical element (DOE) to compensate chromatic aberration happened in aspheric lens surfaces in micro optical system. The DOE was generated with grayscale lithography using high-energy-beam-sensitive (HEBS)-glass, and we finally get DOEs having 4levels and 8levels through this fabrication.

Original languageEnglish
Pages (from-to)686-696
Number of pages11
JournalProceedings of SPIE - The International Society for Optical Engineering
Publication statusPublished - 2004
EventOptical Data Storage 2004 - Monterey, CA, United States
Duration: 2004 Apr 182004 Apr 21

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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