Fabrication of colloidal self-assembled monolayer (SAM) using monodisperse silica and its use as a lithographic mask

Hwa Young Ko, Hae Weon Lee, Jooho Moon

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38 Citations (Scopus)


Monodisperse colloidal silica with controlled sizes (100, 200 and 300 nm) has been prepared by the Stöber process. The shape and monodispersity of the synthesized colloidal particles were observed by scanning electron microscopy and laser light scattering particle analyzer. Self-assembled monolayer (SAM) of monodisperse colloids was obtained by dipping a Si substrate into a well-dispersed silica suspension. It was found that the uniformity and spatial extent of colloidal SAM were significantly influenced by the experimental parameters such as concentration, pH and surface tension of the colloidal suspension. We have observed a hexagonally well-ordered packing colloidal monolayer in a relatively large area (1.5×1.5 mm2). The platinum was sputtered over the colloidal SAM used as a lithographic mask. This produced a honeycomb-shaped patterned Pt structure of thickness ∼60 nm on the Si substrate after the removal of the colloidal silica.

Original languageEnglish
Pages (from-to)638-644
Number of pages7
JournalThin Solid Films
Publication statusPublished - 2004 Jan 30
EventProceedings of the 30th International Conference on Metallurgie - San Diego, CA, United States
Duration: 2002 Apr 282002 May 2

Bibliographical note

Funding Information:
This work was supported by a Grant No. R01-2002-000-00318-0 from Korea Science and Engineering Foundation.

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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