Abstract
For excimer laser annealing (ELA), energy density, number of pulses, beam uniformity, and condition of initial amorphous Si (a-Si) films are significant factors contributing to the final micro structure and the performance of low-temperature polycrystalline Si (LTPS) TFTs. Although the process and equipment have been significantly improved, the environmental factors associated with initial amorphous Si (a-Si) films and process conditions are yet to be optimized.
| Original language | English |
|---|---|
| Pages (from-to) | 1-3 |
| Number of pages | 3 |
| Journal | Journal of Information Display |
| Volume | 4 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 2003 |
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Electrical and Electronic Engineering