Erratum: Enabling nanotechnology with self assembled block copolymer patterns (Polymer 44:23 (6725-6760))

Cheolmin Park; Jongseung Yoon; Edwin L. Thomas

doi:10.1016/j.polymer.2003.09.052

Erratum: Enabling nanotechnology with self assembled block copolymer patterns (Polymer 44:23 (6725-6760))

Cheolmin Park, Jongseung Yoon, Edwin L. Thomas

Department of Materials Science and Engineering

Research output: Contribution to journal › Comment/debate › peer-review

31 Citations (Scopus)

Original language	English
Pages (from-to)	7779
Number of pages	1
Journal	polymer
Volume	44
Issue number	25
DOIs	https://doi.org/10.1016/j.polymer.2003.09.052
Publication status	Published - 2003 Nov 14

Bibliographical note

Funding Information:
C. Park thanks the Ministry of Science and Technology, the Republic of Korea, for financial support through the R & D Program for NT-IT Fusion Strategy of Advanced Technologies. J. Yoon thanks the National Science Foundation for financial support under Grant No. 0103297 (NSF-NIRT). This research was supported in part by the US Army through the Institute for Soldier Nanotechnologies, under Contract DAAD-19-02-D-0002 with the US Army Research Office. The content does not necessarily reflect the position of the Government, and no official endorsement should be inferred.

All Science Journal Classification (ASJC) codes

Organic Chemistry
Polymers and Plastics
Materials Chemistry

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10.1016/j.polymer.2003.09.052

Cite this

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author = "Cheolmin Park and Jongseung Yoon and Thomas, {Edwin L.}",

note = "Funding Information: C. Park thanks the Ministry of Science and Technology, the Republic of Korea, for financial support through the R & D Program for NT-IT Fusion Strategy of Advanced Technologies. J. Yoon thanks the National Science Foundation for financial support under Grant No. 0103297 (NSF-NIRT). This research was supported in part by the US Army through the Institute for Soldier Nanotechnologies, under Contract DAAD-19-02-D-0002 with the US Army Research Office. The content does not necessarily reflect the position of the Government, and no official endorsement should be inferred.",

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AU - Thomas, Edwin L.

N1 - Funding Information: C. Park thanks the Ministry of Science and Technology, the Republic of Korea, for financial support through the R & D Program for NT-IT Fusion Strategy of Advanced Technologies. J. Yoon thanks the National Science Foundation for financial support under Grant No. 0103297 (NSF-NIRT). This research was supported in part by the US Army through the Institute for Soldier Nanotechnologies, under Contract DAAD-19-02-D-0002 with the US Army Research Office. The content does not necessarily reflect the position of the Government, and no official endorsement should be inferred.

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Erratum: Enabling nanotechnology with self assembled block copolymer patterns (Polymer 44:23 (6725-6760))

Bibliographical note

All Science Journal Classification (ASJC) codes

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