Epitaxial CrN(001) Grown and Analyzed in situ by AES after (1) Deposition and (2) Ar+ Sputter Etching

N. Finnegan, T. Y. Lee, R. T. Haasch, J. E. Greene, I. Petrov

Research output: Contribution to journalArticlepeer-review


In situ Auger electron spectroscopy (AES) spectra were obtained on single-crystal CrN(001) layers grown on MgO(001)1 × 1 in a multichamber ultrahigh vacuum (UHV) system. A turbomolecular-pumped magnetron sputter deposition chamber was attached to a Physical Electronics model 660 scanning Auger system to allow spectra to be collected on the as-deposited film without exposure to air. The spectra show that the film surfaces are free of O and C. Spectra are also presented following sputter etching with a 3 keV Ar+ beam at an incident current density of 0.3 mA cm−2. The film was sputtered until the N/Cr peak height ratio reached equilibrium, then spectra were acquired for the after sputter condition. AES spectra were collected for both the as-deposited and the Ar+ sputter etched films using primary beam energies of 3, 5, 10, and 20 keV. The as-deposited bulk film composition was analyzed by Rutherford backscattering spectroscopy (RBS) and found to be stoichiometric with a N/Cr ratio of 1.02 ± 0.02.

Original languageEnglish
Pages (from-to)271-278
Number of pages8
JournalSurface Science Spectra
Issue number3
Publication statusPublished - 2000 Jul 1

Bibliographical note

Publisher Copyright:
© 2000 American Vacuum Society.

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


Dive into the research topics of 'Epitaxial CrN(001) Grown and Analyzed in situ by AES after (1) Deposition and (2) Ar+ Sputter Etching'. Together they form a unique fingerprint.

Cite this