Abstract
Here, we report the microstructural and hydrogen storage properties of a 40-layer film of Pd (x nm)/Ti (40 nm)/Mg (360 nm)/Ti (40 nm) (x = 0, 5, 10, and 20) fabricated using an ultra-high vacuum DC magnetron sputtering system. The superior hydrogen uptake of the Pd/Ti/Mg/Ti films was 6.42 wt. % for x = 10 at 150 °C. The hydrogen absorption time is strongly dependent on the Pd film thickness (0-40 nm). As a result, the Pd/Ti/Mg/Ti multilayer film with the Pd interlayer can be attributed to offer the further diffusion channels and the controlled growth rate of hydride formation at the Pd/Ti/Mg interfaces, which provides an overall enhancement of the hydrogen storage properties.
Original language | English |
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Article number | 193902 |
Journal | Applied Physics Letters |
Volume | 106 |
Issue number | 19 |
DOIs | |
Publication status | Published - 2015 May 11 |
Bibliographical note
Publisher Copyright:© 2015 AIP Publishing LLC.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)