Energy level alignments at tris(8-hydroquinoline) aluminum/8- hydroquinolatolithium/aluminum interfaces

Kwanghee Cho; Sang Wan Cho; Pyung Eun Jeon; Hyunbok Lee; Chung Nam Whang; Kwangho Jeong; Seong Jun Kang; Yeonjin Yi

doi:10.1063/1.2890163

Energy level alignments at tris(8-hydroquinoline) aluminum/8- hydroquinolatolithium/aluminum interfaces

Kwanghee Cho, Sang Wan Cho, Pyung Eun Jeon, Hyunbok Lee, Chung Nam Whang, Kwangho Jeong, Seong Jun Kang, Yeonjin Yi

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

The electronic structures of tris(8-hydroquinoline) aluminum (Al q3) 8 -hydroquinolatolithium (Liq)/Al interfaces were studied using in situ ultraviolet and x-ray photoelectron spectroscopy. We constructed complete energy level diagrams and analyzed chemical interactions at the interface. When Liq was inserted between Al and Al q3, the electron injection barrier was reduced by 0.56 eV compared to the structure without Liq. Additionally, a gap state was observed in the gap of Liq, which is related to an interfacial reaction. The N 1s spectra revealed that there were destructive chemical reactions between Al q3 and Al, which could be prevented by inserting Liq between them.

Original language	English
Article number	093304
Journal	Applied Physics Letters
Volume	92
Issue number	9
DOIs	https://doi.org/10.1063/1.2890163
Publication status	Published - 2008

Bibliographical note

Funding Information:
This work was supported by The Institute of Physics and Applied Physics (IPAP), Yonsei University, and BK21 project of the Korea Research Foundation (KRF).

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.2890163

Cite this

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title = "Energy level alignments at tris(8-hydroquinoline) aluminum/8- hydroquinolatolithium/aluminum interfaces",

abstract = "The electronic structures of tris(8-hydroquinoline) aluminum (Al q3) 8 -hydroquinolatolithium (Liq)/Al interfaces were studied using in situ ultraviolet and x-ray photoelectron spectroscopy. We constructed complete energy level diagrams and analyzed chemical interactions at the interface. When Liq was inserted between Al and Al q3, the electron injection barrier was reduced by 0.56 eV compared to the structure without Liq. Additionally, a gap state was observed in the gap of Liq, which is related to an interfacial reaction. The N 1s spectra revealed that there were destructive chemical reactions between Al q3 and Al, which could be prevented by inserting Liq between them.",

author = "Kwanghee Cho and Cho, {Sang Wan} and Jeon, {Pyung Eun} and Hyunbok Lee and Whang, {Chung Nam} and Kwangho Jeong and Kang, {Seong Jun} and Yeonjin Yi",

note = "Funding Information: This work was supported by The Institute of Physics and Applied Physics (IPAP), Yonsei University, and BK21 project of the Korea Research Foundation (KRF).",

year = "2008",

doi = "10.1063/1.2890163",

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volume = "92",

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AU - Cho, Kwanghee

AU - Cho, Sang Wan

AU - Jeon, Pyung Eun

AU - Lee, Hyunbok

AU - Whang, Chung Nam

AU - Jeong, Kwangho

AU - Kang, Seong Jun

AU - Yi, Yeonjin

N1 - Funding Information: This work was supported by The Institute of Physics and Applied Physics (IPAP), Yonsei University, and BK21 project of the Korea Research Foundation (KRF).

PY - 2008

Y1 - 2008

N2 - The electronic structures of tris(8-hydroquinoline) aluminum (Al q3) 8 -hydroquinolatolithium (Liq)/Al interfaces were studied using in situ ultraviolet and x-ray photoelectron spectroscopy. We constructed complete energy level diagrams and analyzed chemical interactions at the interface. When Liq was inserted between Al and Al q3, the electron injection barrier was reduced by 0.56 eV compared to the structure without Liq. Additionally, a gap state was observed in the gap of Liq, which is related to an interfacial reaction. The N 1s spectra revealed that there were destructive chemical reactions between Al q3 and Al, which could be prevented by inserting Liq between them.

AB - The electronic structures of tris(8-hydroquinoline) aluminum (Al q3) 8 -hydroquinolatolithium (Liq)/Al interfaces were studied using in situ ultraviolet and x-ray photoelectron spectroscopy. We constructed complete energy level diagrams and analyzed chemical interactions at the interface. When Liq was inserted between Al and Al q3, the electron injection barrier was reduced by 0.56 eV compared to the structure without Liq. Additionally, a gap state was observed in the gap of Liq, which is related to an interfacial reaction. The N 1s spectra revealed that there were destructive chemical reactions between Al q3 and Al, which could be prevented by inserting Liq between them.

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Energy level alignments at tris(8-hydroquinoline) aluminum/8- hydroquinolatolithium/aluminum interfaces

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

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