Emissive pattern formation by the photoreaction of poly(p-phenylene vinylene)

Yuna Kim, Chijung Yun, Parashuram Jadhav, Jungmok You, Eunkyoung Kim

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5 Citations (Scopus)


The vinylene unit of a p-phenylene polymer was photo-oxidized under atmospheric oxygen to provide emittive patterns. Thin films of poly[2-methoxy-5-(3,7-dimethyloctyloxy)-p-phenylene vinylene] (MDMO-PPV) were directly photo-patterned by UV light through a photo-mask having 1 μm-wide lines. The absorption and fluorescence studies on the MDMO-PPV film by UV irradiation indicated that the photo-patterning was mainly originated from the oxidation of the vinylic bonds to give carbonyl (C{double bond, long}O) containing polymers. The patterned MDMO-PPV film was applied to an electroluminescent cell, which showed 20 μm-wide luminescent line patterns at applied potential of 5 V.

Original languageEnglish
Pages (from-to)1088-1092
Number of pages5
JournalCurrent Applied Physics
Issue number5
Publication statusPublished - 2009 Sept

Bibliographical note

Funding Information:
We acknowledge the financial support by the Ministry of the Education, Science and Technology (MEST) (No. R11-2007-050-01001-0) and Seoul city R&DB program.

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Physics and Astronomy(all)


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