Emissive pattern formation by the photoreaction of poly(p-phenylene vinylene)

Yuna Kim; Chijung Yun; Parashuram Jadhav; Jungmok You; Eunkyoung Kim

doi:10.1016/j.cap.2008.12.007

Emissive pattern formation by the photoreaction of poly(p-phenylene vinylene)

Yuna Kim, Chijung Yun, Parashuram Jadhav, Jungmok You, Eunkyoung Kim

Department of Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

The vinylene unit of a p-phenylene polymer was photo-oxidized under atmospheric oxygen to provide emittive patterns. Thin films of poly[2-methoxy-5-(3,7-dimethyloctyloxy)-p-phenylene vinylene] (MDMO-PPV) were directly photo-patterned by UV light through a photo-mask having 1 μm-wide lines. The absorption and fluorescence studies on the MDMO-PPV film by UV irradiation indicated that the photo-patterning was mainly originated from the oxidation of the vinylic bonds to give carbonyl (C{double bond, long}O) containing polymers. The patterned MDMO-PPV film was applied to an electroluminescent cell, which showed 20 μm-wide luminescent line patterns at applied potential of 5 V.

Original language	English
Pages (from-to)	1088-1092
Number of pages	5
Journal	Current Applied Physics
Volume	9
Issue number	5
DOIs	https://doi.org/10.1016/j.cap.2008.12.007
Publication status	Published - 2009 Sept

Bibliographical note

Funding Information:
We acknowledge the financial support by the Ministry of the Education, Science and Technology (MEST) (No. R11-2007-050-01001-0) and Seoul city R&DB program.

All Science Journal Classification (ASJC) codes

Materials Science(all)
Physics and Astronomy(all)

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10.1016/j.cap.2008.12.007

Cite this

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title = "Emissive pattern formation by the photoreaction of poly(p-phenylene vinylene)",

abstract = "The vinylene unit of a p-phenylene polymer was photo-oxidized under atmospheric oxygen to provide emittive patterns. Thin films of poly[2-methoxy-5-(3,7-dimethyloctyloxy)-p-phenylene vinylene] (MDMO-PPV) were directly photo-patterned by UV light through a photo-mask having 1 μm-wide lines. The absorption and fluorescence studies on the MDMO-PPV film by UV irradiation indicated that the photo-patterning was mainly originated from the oxidation of the vinylic bonds to give carbonyl (C{double bond, long}O) containing polymers. The patterned MDMO-PPV film was applied to an electroluminescent cell, which showed 20 μm-wide luminescent line patterns at applied potential of 5 V.",

author = "Yuna Kim and Chijung Yun and Parashuram Jadhav and Jungmok You and Eunkyoung Kim",

note = "Funding Information: We acknowledge the financial support by the Ministry of the Education, Science and Technology (MEST) (No. R11-2007-050-01001-0) and Seoul city R&DB program.",

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T1 - Emissive pattern formation by the photoreaction of poly(p-phenylene vinylene)

AU - Kim, Yuna

AU - Yun, Chijung

AU - Jadhav, Parashuram

AU - You, Jungmok

AU - Kim, Eunkyoung

N1 - Funding Information: We acknowledge the financial support by the Ministry of the Education, Science and Technology (MEST) (No. R11-2007-050-01001-0) and Seoul city R&DB program.

PY - 2009/9

Y1 - 2009/9

N2 - The vinylene unit of a p-phenylene polymer was photo-oxidized under atmospheric oxygen to provide emittive patterns. Thin films of poly[2-methoxy-5-(3,7-dimethyloctyloxy)-p-phenylene vinylene] (MDMO-PPV) were directly photo-patterned by UV light through a photo-mask having 1 μm-wide lines. The absorption and fluorescence studies on the MDMO-PPV film by UV irradiation indicated that the photo-patterning was mainly originated from the oxidation of the vinylic bonds to give carbonyl (C{double bond, long}O) containing polymers. The patterned MDMO-PPV film was applied to an electroluminescent cell, which showed 20 μm-wide luminescent line patterns at applied potential of 5 V.

AB - The vinylene unit of a p-phenylene polymer was photo-oxidized under atmospheric oxygen to provide emittive patterns. Thin films of poly[2-methoxy-5-(3,7-dimethyloctyloxy)-p-phenylene vinylene] (MDMO-PPV) were directly photo-patterned by UV light through a photo-mask having 1 μm-wide lines. The absorption and fluorescence studies on the MDMO-PPV film by UV irradiation indicated that the photo-patterning was mainly originated from the oxidation of the vinylic bonds to give carbonyl (C{double bond, long}O) containing polymers. The patterned MDMO-PPV film was applied to an electroluminescent cell, which showed 20 μm-wide luminescent line patterns at applied potential of 5 V.

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Emissive pattern formation by the photoreaction of poly(p-phenylene vinylene)

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

Access to Document

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