Abstract
A new device architecture for flexible vertical Schottky barrier (SB) transistors and logic gates based on graphene-organic-semiconductor-metal heterostructures and ion gel gate dielectrics is demonstrated. The devices show well-behaved p- and n-type characteristics under low-voltage operation (<1 V), yielding high current densities (>100 mA cm-2) and on/off current ratios (>103).
Original language | English |
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Pages (from-to) | 5875-5881 |
Number of pages | 7 |
Journal | Advanced Materials |
Volume | 27 |
Issue number | 39 |
DOIs | |
Publication status | Published - 2015 Oct 1 |
Bibliographical note
Publisher Copyright:© 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim.
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering