Electrical properties and thermal stability in stack structure of HfO2/Al2O3/InSb by atomic layer deposition

Min Baik, Hang Kyu Kang, Yu Seon Kang, Kwang Sik Jeong, Youngseo An, Seongheum Choi, Hyoungsub Kim, Jin Dong Song, Mann Ho Cho

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

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