Effective work function lowering of multilayer graphene films by subnanometer thick AlOx overlayers

Yeonjin Yi; Won Mook Choi; Yoon Hak Kim; Jeong Won Kim; Seong Jun Kang

doi:10.1063/1.3534795

Effective work function lowering of multilayer graphene films by subnanometer thick AlO_x overlayers

Yeonjin Yi, Won Mook Choi, Yoon Hak Kim, Jeong Won Kim, Seong Jun Kang

Department of Physics

Research output: Contribution to journal › Article › peer-review

30 Citations (Scopus)

Abstract

A simple method for controlling the effective work function (WF) of conductive multilayer graphene (MLG) film, synthesized by using chemical vapor deposition and transferred to a dielectric substrate, was developed. The WFs of the MLG during the step-by-step deposition of aluminum (Al) were measured using in situ ultraviolet photoelectron spectroscopy. Core-level spectra were also collected to investigate the chemical reaction that occurred when a small amount of Al was deposited onto MLG in a stepwise manner. The measurements revealed that the effective WF of the conductive MLG film could be controlled from 3.77 to 4.40 eV by the deposition of an Al layer less than 0.6 nm thick.

Original language	English
Article number	013505
Journal	Applied Physics Letters
Volume	98
Issue number	1
DOIs	https://doi.org/10.1063/1.3534795
Publication status	Published - 2011 Jan 3

Bibliographical note

Funding Information:
This work was supported by a research project of the National Research Foundation of Korea (Grant Nos. 2010-0015727, 2010-0003009, and 2010-0010007), by the Korea Research Council of Fundamental Science and Technology, and by the GRRC program of Gyeonggi province (GRRC Kyung Hee 2010-B07).

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

Access to Document

10.1063/1.3534795

Cite this

@article{dbdf159cd2834fc99c0cd87d4097dca2,

title = "Effective work function lowering of multilayer graphene films by subnanometer thick AlOx overlayers",

abstract = "A simple method for controlling the effective work function (WF) of conductive multilayer graphene (MLG) film, synthesized by using chemical vapor deposition and transferred to a dielectric substrate, was developed. The WFs of the MLG during the step-by-step deposition of aluminum (Al) were measured using in situ ultraviolet photoelectron spectroscopy. Core-level spectra were also collected to investigate the chemical reaction that occurred when a small amount of Al was deposited onto MLG in a stepwise manner. The measurements revealed that the effective WF of the conductive MLG film could be controlled from 3.77 to 4.40 eV by the deposition of an Al layer less than 0.6 nm thick.",

author = "Yeonjin Yi and Choi, {Won Mook} and Kim, {Yoon Hak} and {Won Kim}, Jeong and Kang, {Seong Jun}",

note = "Funding Information: This work was supported by a research project of the National Research Foundation of Korea (Grant Nos. 2010-0015727, 2010-0003009, and 2010-0010007), by the Korea Research Council of Fundamental Science and Technology, and by the GRRC program of Gyeonggi province (GRRC Kyung Hee 2010-B07).",

year = "2011",

month = jan,

day = "3",

doi = "10.1063/1.3534795",

language = "English",

volume = "98",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "1",

}

TY - JOUR

T1 - Effective work function lowering of multilayer graphene films by subnanometer thick AlOx overlayers

AU - Yi, Yeonjin

AU - Choi, Won Mook

AU - Kim, Yoon Hak

AU - Won Kim, Jeong

AU - Kang, Seong Jun

N1 - Funding Information: This work was supported by a research project of the National Research Foundation of Korea (Grant Nos. 2010-0015727, 2010-0003009, and 2010-0010007), by the Korea Research Council of Fundamental Science and Technology, and by the GRRC program of Gyeonggi province (GRRC Kyung Hee 2010-B07).

PY - 2011/1/3

Y1 - 2011/1/3

N2 - A simple method for controlling the effective work function (WF) of conductive multilayer graphene (MLG) film, synthesized by using chemical vapor deposition and transferred to a dielectric substrate, was developed. The WFs of the MLG during the step-by-step deposition of aluminum (Al) were measured using in situ ultraviolet photoelectron spectroscopy. Core-level spectra were also collected to investigate the chemical reaction that occurred when a small amount of Al was deposited onto MLG in a stepwise manner. The measurements revealed that the effective WF of the conductive MLG film could be controlled from 3.77 to 4.40 eV by the deposition of an Al layer less than 0.6 nm thick.

AB - A simple method for controlling the effective work function (WF) of conductive multilayer graphene (MLG) film, synthesized by using chemical vapor deposition and transferred to a dielectric substrate, was developed. The WFs of the MLG during the step-by-step deposition of aluminum (Al) were measured using in situ ultraviolet photoelectron spectroscopy. Core-level spectra were also collected to investigate the chemical reaction that occurred when a small amount of Al was deposited onto MLG in a stepwise manner. The measurements revealed that the effective WF of the conductive MLG film could be controlled from 3.77 to 4.40 eV by the deposition of an Al layer less than 0.6 nm thick.

UR - http://www.scopus.com/inward/record.url?scp=78651275995&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=78651275995&partnerID=8YFLogxK

U2 - 10.1063/1.3534795

DO - 10.1063/1.3534795

M3 - Article

AN - SCOPUS:78651275995

SN - 0003-6951

VL - 98

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 1

M1 - 013505

ER -