Effect of modification of S-terminated Ge(1 0 0) surface on ALD HfO 2 gate stack

Younghwan Lee, Kibyung Park, Kyung Taek Im, June Young Lee, Seongil Im, Jung Han Lee, Yeonjin Yi, Sangwoo Lim

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

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Material Science