Effect of alcohol-based sulfur treatment on Pt Ohmic contacts to p-type GaN

Chul Huh, Sang Woo Kim, Hyun Min Kim, Dong Joon Kim, Seong Ju Park

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41 Citations (Scopus)

Abstract

The effects of an alcohol-based (NH4)2S solution [t-C4H9OH+(NH4)2S] treatment on Pt Ohmic contacts to p-type GaN are presented. The specific contact resistance decreased by three orders of magnitude from 2.56x 10-2to 4.71 x 10-5Ω cm2as a result of surface treatment using an alcohol-based (NH4)2S solution compared to that of the untreated sample. The O 1s and Pt 4f core-level peaks in the x-ray photoemission spectra showed that the alcohol-based (NH4)2S treatment was effective in removing of the surface oxide layer. Compared to the untreated sample, the alcohol-based (NH4)2S-treated sample showed a Ga 2p core-level peak which was shifted toward the valence-band edge by 0.25 eV, indicating that the surface Fermi level was shifted toward the valence-band edge. These results suggest that the surface barrier height for hole injection from Pt metal to p-type GaN can be lowered by the surface treatment, thus resulting in a drastic reduction in specific contact resistance.

Original languageEnglish
Pages (from-to)1942-1944
Number of pages3
JournalApplied Physics Letters
Volume78
Issue number13
DOIs
Publication statusPublished - 2001 Mar 26

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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