Abstract
We report on the photo-response behavior of n-ZnO/p-Si photodiodes. Semiconducting n-ZnO films have been deposited on p-Si substrate by RF sputtering at 300, 480 and 550°C. An optimum static photo-response was achieved from the photodiode prepared at 480°C as characterized by photocurrent measurements using a continuous monochromatic red illumination. Temporal photo-response of 35 ns was obtained from the same n-ZnO/p-Si diode to which a high frequency modulation of 1.5 MHz was applied for the dynamic response measurements. It is concluded that the n-ZnO/p-Si photodiode has good detecting capabilities in both of the dynamic and static photo-responses.
Original language | English |
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Pages (from-to) | 1560-1562 |
Number of pages | 3 |
Journal | Japanese Journal of Applied Physics |
Volume | 42 |
Issue number | 4 A |
DOIs | |
Publication status | Published - 2003 Apr |
All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy(all)