Dramatic change of electrical properties in La-Ba-Mn-O thin films prepared using bias sputtering

Jong Cheol Lee; Sang Yub Le; Seung Lel Park; Yeonjin Yi; Gyu In Jang; Ho Shik Song; Dong Gyun You; Kwangho Jeong

doi:10.1116/1.1519866

Dramatic change of electrical properties in La-Ba-Mn-O thin films prepared using bias sputtering

Jong Cheol Lee, Sang Yub Le, Seung Lel Park, Yeonjin Yi, Gyu In Jang, Ho Shik Song, Dong Gyun You, Kwangho Jeong

Department of Physics

Research output: Contribution to journal › Article › peer-review

Abstract

Bias sputtering was employed to reduce the bombardment to the growing film by negative metal oxide ions or negative oxygen ions. Polycrystalline La-Ba-Mn-O thin films were grown using rf magnetron sputtering on Si (100) substrates. The temperature dependence of electrical resistivity was shown for films with grounded or negatively biased substrate.

Original language	English
Pages (from-to)	2115-2118
Number of pages	4
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	20
Issue number	6
DOIs	https://doi.org/10.1116/1.1519866
Publication status	Published - 2002 Nov

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.1519866

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abstract = "Bias sputtering was employed to reduce the bombardment to the growing film by negative metal oxide ions or negative oxygen ions. Polycrystalline La-Ba-Mn-O thin films were grown using rf magnetron sputtering on Si (100) substrates. The temperature dependence of electrical resistivity was shown for films with grounded or negatively biased substrate.",

author = "Lee, {Jong Cheol} and Le, {Sang Yub} and Park, {Seung Lel} and Yeonjin Yi and Jang, {Gyu In} and Song, {Ho Shik} and You, {Dong Gyun} and Kwangho Jeong",

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AU - Lee, Jong Cheol

AU - Le, Sang Yub

AU - Park, Seung Lel

AU - Yi, Yeonjin

AU - Jang, Gyu In

AU - Song, Ho Shik

AU - You, Dong Gyun

AU - Jeong, Kwangho

PY - 2002/11

Y1 - 2002/11

N2 - Bias sputtering was employed to reduce the bombardment to the growing film by negative metal oxide ions or negative oxygen ions. Polycrystalline La-Ba-Mn-O thin films were grown using rf magnetron sputtering on Si (100) substrates. The temperature dependence of electrical resistivity was shown for films with grounded or negatively biased substrate.

AB - Bias sputtering was employed to reduce the bombardment to the growing film by negative metal oxide ions or negative oxygen ions. Polycrystalline La-Ba-Mn-O thin films were grown using rf magnetron sputtering on Si (100) substrates. The temperature dependence of electrical resistivity was shown for films with grounded or negatively biased substrate.

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Dramatic change of electrical properties in La-Ba-Mn-O thin films prepared using bias sputtering

Abstract

All Science Journal Classification (ASJC) codes

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