Development of a wide-width raster scanning optical system for high-resolution ultraviolet laser direct micro-patterning

Jong Bok Park, Hyun Choi, Geon Lim, Dong Kil Lee, No Cheol Park, Wan Chin Kim

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

We developed F-theta raster scanning optics for high-resolution ultraviolet (UV) beam direct micro-patterning, capable of machining on a 300-mm wide image with a confined beam spot of less than 20 μm, a 13.5% spot size. To achieve the imaging performance with resolution, F-theta optics based on synthetic silica glass were designed using a high-power laser light source with a wavelength of 355 nm. In addition, to improve the difficulty of optical alignment in conventional systems and the scan linearity between the scan angle and exposing position, F-theta scanning optics were designed to contain two lenses with a rotationally asymmetric high-order polynomial surface. The designed optical system showed a performance of 20 ± 2 μm at the full width of a 1/e2 maximum intensity value through a 0.8 mm focal depth. The scanning linearity error and root-mean-square (RMS) wavefront error were designed to be less than 0.2% and 0.05 λ, respectively.

Original languageEnglish
Article number106179
JournalOptics and Lasers in Engineering
Volume134
DOIs
Publication statusPublished - 2020 Nov

Bibliographical note

Publisher Copyright:
© 2020 Elsevier Ltd

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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