Development of a two-chamber process for self-assembling a fluorooctatrichlorosilane monolayer for the nanoimprinting of full-track nanopatterns with a 35 nm half pitch

Engineering

• Silicon 100%
• Self-Assembled Monolayers 50%
• Adhesion Layer 50%
• Plasma Treatment 33%
• Contamination 33%
• Surfaces 33%
• Properties 33%
• Pitch 33%
• Monolayer 16%
• Chemical Composition 16%
• Replication Quality 16%
• Deposition System 16%
• Process Chamber 16%
• Layer Coating 16%
• Development 16%

Chemistry

• Self Assembled Monolayer 50%
• Surface 33%
• Degradation 33%
• Monomer 16%
• Monolayer 16%
• Procedure 16%
• Engineering Process 16%
• Sample 16%
• Wetting 16%
• Chemical Reaction 16%
• Molecule 16%

Material Science

• Self Assembled Monolayer 50%
• Adhesion 33%
• Surface 33%
• Monolayers 16%
• Contact Angle 16%