Development and application of a direct beam lithography for the bioelectronic device

Jeong Woo Choi, Yun Suk Nam, Se Yong Oh, Dongho Kim, Won Hong Lee

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)


Direct beam patterning on metal/protein/organic material coated ITO substrates is investigated using laser light for submicron scale lithography. A laser writing lithography method is developed using the 400nm Ti:Sapphire laser. Using a microscope objective lens, a laser beam is focused onto a glass slide coated with metal/protein/organic material film. Localized laser absorption results in partial melting and ablation of film. Spatially moving the laser spot, a stable etched pattern is obtained at submicron resolution. This result opens many possibilities for microfabrication of bioelectronic devices.

Original languageEnglish
Pages (from-to)295-298
Number of pages4
JournalMolecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Publication statusPublished - 2000
EventProceedings of the Korea-Japan Joint Forum 1999 Organic Materials for Electronics and Photonics - Kyongju, South Korea
Duration: 1999 Sept 91999 Sept 11

Bibliographical note

Funding Information:
Acknoldgement This work was supported by grants €tom the Korea Ministry of Science and Technology (98-NF-02-07-A-01) and National Creative Research Initiatives of Ministry of Science and Technology.

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics


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