The development of a lithographic method that can rapidly define nanoscale features across centimetre-scale surfaces has been a long-standing goal for the nanotechnology community. If such a 'desktop nanofab' could be implemented in a low-cost format, it would bring the possibility of point-of-use nanofabrication for rapidly prototyping diverse functional structures. Here we report the development of a new tool that is capable of writing arbitrary patterns composed of diffraction-unlimited features over square centimetre areas that are in registry with existing patterns and nanostructures. Importantly, this instrument is based on components that are inexpensive compared with the combination of state-of-the-art nanofabrication tools that approach its capabilities. This tool can be used to prototype functional electronic devices in a mask-free fashion in addition to providing a unique platform for performing high-throughput nano- to macroscale photochemistry with relevance to biology and medicine.
|Publication status||Published - 2013|
Bibliographical noteFunding Information:
This material is based upon work supported by DARPA/MTO Award N66001-08-1-2044, AOARD Award FA2386-10-1-4065, AFOSR Awards FA9550-12-1-0280 and FA9550-12-1-0141, NSF Awards DBI-1152139 and DMB-1124131, DoD/NPS/NSSEF Fellowship Awards N00244-09-1-0012 and N00244-09-1-0071, Chicago Biomedical Consortium with support from Searle Funds at The Chicago Community Trust and CCNE initiative of NIH Award U54 CA151880. Any opinions, findings, and conclusions or recommendations expressed in this publication are those of the authors and do not necessarily reflect the views of the sponsors. K.A.B. and X.L. gratefully acknowledge support from Northwestern University’s International Institute for Nanotechnology.
All Science Journal Classification (ASJC) codes
- Biochemistry, Genetics and Molecular Biology(all)
- Physics and Astronomy(all)