Design of antireflective subwavelength grating structure for infrared medical imaging

Xun Zheng; Soonkyu Je; Byungwook Kim; Jongmyeong Shim; Shinill Kang

doi:10.1109/INEC.2010.5424458

Design of antireflective subwavelength grating structure for infrared medical imaging

Xun Zheng, Soonkyu Je, Byungwook Kim, Jongmyeong Shim, Shinill Kang

Department of Mechanical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

A subwavelength grating (SWG) structure was designed and simulated on a germanium substrate to reduce the Fresnel reflection of transmissive optical elements. Three different grating structures were compared and analyzed by solving Maxwell's equations using rigorous coupled wave analysis (RCWA) method. The designed antireflective SWG of 2 dimensional sinusoidal structure has pitch of 2.3 μm and pattern height of 3.3 μm for maximum sensitivity of infrared medical camera at wavelength ranging from 8 μm to 12 μm. The 2D photoresist sinusoidal grating structure, to be used as etching barrier for fabrication of antireflective germanium grating structure, was fabricated by laser interference lithography.

Original language	English
Title of host publication	INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings
Pages	767-768
Number of pages	2
DOIs	https://doi.org/10.1109/INEC.2010.5424458
Publication status	Published - 2010
Event	2010 3rd International Nanoelectronics Conference, INEC 2010 - Hongkong, China Duration: 2010 Jan 3 → 2010 Jan 8

Publication series

Name	INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

Other

Other	2010 3rd International Nanoelectronics Conference, INEC 2010
Country/Territory	China
City	Hongkong
Period	10/1/3 → 10/1/8

All Science Journal Classification (ASJC) codes

Electrical and Electronic Engineering

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10.1109/INEC.2010.5424458

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@inproceedings{292cdbad55904b92a91cf1ab195eacce,

title = "Design of antireflective subwavelength grating structure for infrared medical imaging",

abstract = "A subwavelength grating (SWG) structure was designed and simulated on a germanium substrate to reduce the Fresnel reflection of transmissive optical elements. Three different grating structures were compared and analyzed by solving Maxwell's equations using rigorous coupled wave analysis (RCWA) method. The designed antireflective SWG of 2 dimensional sinusoidal structure has pitch of 2.3 μm and pattern height of 3.3 μm for maximum sensitivity of infrared medical camera at wavelength ranging from 8 μm to 12 μm. The 2D photoresist sinusoidal grating structure, to be used as etching barrier for fabrication of antireflective germanium grating structure, was fabricated by laser interference lithography.",

author = "Xun Zheng and Soonkyu Je and Byungwook Kim and Jongmyeong Shim and Shinill Kang",

year = "2010",

doi = "10.1109/INEC.2010.5424458",

language = "English",

isbn = "9781424435449",

series = "INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings",

pages = "767--768",

booktitle = "INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings",

note = "2010 3rd International Nanoelectronics Conference, INEC 2010 ; Conference date: 03-01-2010 Through 08-01-2010",

}

Zheng, X, Je, S, Kim, B, Shim, J & Kang, S 2010, Design of antireflective subwavelength grating structure for infrared medical imaging. in INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings., 5424458, INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings, pp. 767-768, 2010 3rd International Nanoelectronics Conference, INEC 2010, Hongkong, China, 10/1/3. https://doi.org/10.1109/INEC.2010.5424458

Design of antireflective subwavelength grating structure for infrared medical imaging. / Zheng, Xun; Je, Soonkyu; Kim, Byungwook et al.
INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings. 2010. p. 767-768 5424458 (INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Design of antireflective subwavelength grating structure for infrared medical imaging

AU - Zheng, Xun

AU - Je, Soonkyu

AU - Kim, Byungwook

AU - Shim, Jongmyeong

AU - Kang, Shinill

PY - 2010

Y1 - 2010

N2 - A subwavelength grating (SWG) structure was designed and simulated on a germanium substrate to reduce the Fresnel reflection of transmissive optical elements. Three different grating structures were compared and analyzed by solving Maxwell's equations using rigorous coupled wave analysis (RCWA) method. The designed antireflective SWG of 2 dimensional sinusoidal structure has pitch of 2.3 μm and pattern height of 3.3 μm for maximum sensitivity of infrared medical camera at wavelength ranging from 8 μm to 12 μm. The 2D photoresist sinusoidal grating structure, to be used as etching barrier for fabrication of antireflective germanium grating structure, was fabricated by laser interference lithography.

AB - A subwavelength grating (SWG) structure was designed and simulated on a germanium substrate to reduce the Fresnel reflection of transmissive optical elements. Three different grating structures were compared and analyzed by solving Maxwell's equations using rigorous coupled wave analysis (RCWA) method. The designed antireflective SWG of 2 dimensional sinusoidal structure has pitch of 2.3 μm and pattern height of 3.3 μm for maximum sensitivity of infrared medical camera at wavelength ranging from 8 μm to 12 μm. The 2D photoresist sinusoidal grating structure, to be used as etching barrier for fabrication of antireflective germanium grating structure, was fabricated by laser interference lithography.

UR - http://www.scopus.com/inward/record.url?scp=77951664049&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77951664049&partnerID=8YFLogxK

U2 - 10.1109/INEC.2010.5424458

DO - 10.1109/INEC.2010.5424458

M3 - Conference contribution

AN - SCOPUS:77951664049

SN - 9781424435449

T3 - INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

SP - 767

EP - 768

BT - INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

T2 - 2010 3rd International Nanoelectronics Conference, INEC 2010

Y2 - 3 January 2010 through 8 January 2010

ER -

Design of antireflective subwavelength grating structure for infrared medical imaging

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