Abstract
This paper demonstrates a method to improve the accuracy of the ground-plane cloak by compensating for the lateral beam shift. The lateral beam shift can be compensated by increasing the height of the bump with the upper boundary of the cloak and shifting the reference ground plane downwards in the cloaking region. Moreover, the asymmetric ground-plane cloak, which represents not only the lateral beam shift but also an error of the reflection angle, is also compensated by generating the initial grids unequally. The accuracy of the proposed method is verified via ray tracing simulation.
| Original language | English |
|---|---|
| Pages (from-to) | 288-298 |
| Number of pages | 11 |
| Journal | International Journal of Nanotechnology |
| Volume | 13 |
| Issue number | 4-6 |
| DOIs | |
| Publication status | Published - 2016 |
Bibliographical note
Publisher Copyright:© 2016 Inderscience Enterprises Ltd.
All Science Journal Classification (ASJC) codes
- Bioengineering
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry