Deposition sequence dependent variation in interfacial chemical reactions between 8-hydroxyquinolatolithium and Al

Young Mi Lee; Yongsup Park; Yeonjin Yi; Jeong Won Kim

doi:10.1063/1.2987737

Deposition sequence dependent variation in interfacial chemical reactions between 8-hydroxyquinolatolithium and Al

Young Mi Lee, Yongsup Park, Yeonjin Yi, Jeong Won Kim

Department of Physics

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

The chemical reactions between 8-hydroxyquinolatolithium (Liq) and Al were investigated by using high resolution synchrotron radiation photoelectron spectroscopy. Unlike the LiF/Al case, two opposite deposition sequences (Al/Liq versus Liq/Al) give different interface reactions. When Al is deposited on a Liq layer, there occurs a strong reaction between Liq and Al, which accounts for a clear peak shift in the Li 1s core level. On the other hand, an interface-localized charge transfer without Li 1s splitting occurs with the reversed deposition sequence. The former strong interface reaction can generate ionic Li as a dopant material in Liq layer, causing band bending.

Original language	English
Article number	123301
Journal	Applied Physics Letters
Volume	93
Issue number	12
DOIs	https://doi.org/10.1063/1.2987737
Publication status	Published - 2008

Bibliographical note

Funding Information:
Y.M.L. was supported by the Kyung Hee University Post-Doctoral Research Associate Fund in 2008 (Grant No. 20080276). PAL was supported by MOST and POSCO. Special thanks are given to Dr. Soonnam Kwon for helpful discussion and to Ms. H.-N. Hwang for experimental assistance.

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.2987737

Cite this

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title = "Deposition sequence dependent variation in interfacial chemical reactions between 8-hydroxyquinolatolithium and Al",

abstract = "The chemical reactions between 8-hydroxyquinolatolithium (Liq) and Al were investigated by using high resolution synchrotron radiation photoelectron spectroscopy. Unlike the LiF/Al case, two opposite deposition sequences (Al/Liq versus Liq/Al) give different interface reactions. When Al is deposited on a Liq layer, there occurs a strong reaction between Liq and Al, which accounts for a clear peak shift in the Li 1s core level. On the other hand, an interface-localized charge transfer without Li 1s splitting occurs with the reversed deposition sequence. The former strong interface reaction can generate ionic Li as a dopant material in Liq layer, causing band bending.",

author = "Lee, {Young Mi} and Yongsup Park and Yeonjin Yi and {Won Kim}, Jeong",

note = "Funding Information: Y.M.L. was supported by the Kyung Hee University Post-Doctoral Research Associate Fund in 2008 (Grant No. 20080276). PAL was supported by MOST and POSCO. Special thanks are given to Dr. Soonnam Kwon for helpful discussion and to Ms. H.-N. Hwang for experimental assistance.",

year = "2008",

doi = "10.1063/1.2987737",

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volume = "93",

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AU - Lee, Young Mi

AU - Park, Yongsup

AU - Yi, Yeonjin

AU - Won Kim, Jeong

N1 - Funding Information: Y.M.L. was supported by the Kyung Hee University Post-Doctoral Research Associate Fund in 2008 (Grant No. 20080276). PAL was supported by MOST and POSCO. Special thanks are given to Dr. Soonnam Kwon for helpful discussion and to Ms. H.-N. Hwang for experimental assistance.

PY - 2008

Y1 - 2008

N2 - The chemical reactions between 8-hydroxyquinolatolithium (Liq) and Al were investigated by using high resolution synchrotron radiation photoelectron spectroscopy. Unlike the LiF/Al case, two opposite deposition sequences (Al/Liq versus Liq/Al) give different interface reactions. When Al is deposited on a Liq layer, there occurs a strong reaction between Liq and Al, which accounts for a clear peak shift in the Li 1s core level. On the other hand, an interface-localized charge transfer without Li 1s splitting occurs with the reversed deposition sequence. The former strong interface reaction can generate ionic Li as a dopant material in Liq layer, causing band bending.

AB - The chemical reactions between 8-hydroxyquinolatolithium (Liq) and Al were investigated by using high resolution synchrotron radiation photoelectron spectroscopy. Unlike the LiF/Al case, two opposite deposition sequences (Al/Liq versus Liq/Al) give different interface reactions. When Al is deposited on a Liq layer, there occurs a strong reaction between Liq and Al, which accounts for a clear peak shift in the Li 1s core level. On the other hand, an interface-localized charge transfer without Li 1s splitting occurs with the reversed deposition sequence. The former strong interface reaction can generate ionic Li as a dopant material in Liq layer, causing band bending.

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Deposition sequence dependent variation in interfacial chemical reactions between 8-hydroxyquinolatolithium and Al

Abstract

Bibliographical note

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