Abstract
We report on photo-excited trap-charge-collection spectroscopy, contrived to measure the density of deep-level traps near channel/dielectric interface in a working ZnO based thin-film transistor as a function of photon probe energy. Free charges trapped at a certain energy level are liberated by the correspondingly energetic photons and then electrically collected at the source/drain electrodes. During this photo-electric process, the threshold voltage of TFT shifts and its magnitude provides the density-of-state information of charge traps. In the present work, we directly characterized the density-of-state of ZnO based thin-film transistors with polymer-oxide double dielectrics after evaluating their gate stabilities.
Original language | English |
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Article number | 082110 |
Journal | Applied Physics Letters |
Volume | 97 |
Issue number | 8 |
DOIs | |
Publication status | Published - 2010 Aug 23 |
Bibliographical note
Funding Information:Authors acknowledge the financial support from NRF (NRL program: Grant No. 2009-8-0403) and Brain Korea 21 Program.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)