Covalent stabilization of nanostructures: Robust block copolymer templates from novel thermoreactive systems

Eric Drockenmuller; Lucy Y.T. Li; Du Yeol Ryu; Eva Harth; Thomas P. Russell; Ho Cheol Kim; Craig J. Hawker

doi:10.1002/pola.20553

Covalent stabilization of nanostructures: Robust block copolymer templates from novel thermoreactive systems

Eric Drockenmuller, Lucy Y.T. Li, Du Yeol Ryu, Eva Harth, Thomas P. Russell, Ho Cheol Kim, Craig J. Hawker

Department of Chemical and Biomolecular Engineering

Research output: Contribution to journal › Article › peer-review

86 Citations (Scopus)

Abstract

Structurally robust block copolymer templates with feature sizes of approximately 10 nm were prepared from functionalized poly(methyl methacrylate)-b-polystyrene block copolymers. By the inclusion of benzocyclobutene crosslinking groups in the polystyrene block, the covalent stabilization of thin films to both thermal treatment and solvent exposure became possible. In addition, the crosslinking of the poly(styrene- benzocyclobutene) domains at 220°C, followed by the removal of poly(methyl methacrylate), provided a robust, crosslinked nanostructure with greater processing and fabrication potential.

Original language	English
Pages (from-to)	1028-1037
Number of pages	10
Journal	Journal of Polymer Science, Part A: Polymer Chemistry
Volume	43
Issue number	5
DOIs	https://doi.org/10.1002/pola.20553
Publication status	Published - 2005 Mar 1

All Science Journal Classification (ASJC) codes

Polymers and Plastics
Organic Chemistry
Materials Chemistry

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abstract = "Structurally robust block copolymer templates with feature sizes of approximately 10 nm were prepared from functionalized poly(methyl methacrylate)-b-polystyrene block copolymers. By the inclusion of benzocyclobutene crosslinking groups in the polystyrene block, the covalent stabilization of thin films to both thermal treatment and solvent exposure became possible. In addition, the crosslinking of the poly(styrene- benzocyclobutene) domains at 220°C, followed by the removal of poly(methyl methacrylate), provided a robust, crosslinked nanostructure with greater processing and fabrication potential.",

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AU - Harth, Eva

AU - Russell, Thomas P.

AU - Kim, Ho Cheol

AU - Hawker, Craig J.

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AB - Structurally robust block copolymer templates with feature sizes of approximately 10 nm were prepared from functionalized poly(methyl methacrylate)-b-polystyrene block copolymers. By the inclusion of benzocyclobutene crosslinking groups in the polystyrene block, the covalent stabilization of thin films to both thermal treatment and solvent exposure became possible. In addition, the crosslinking of the poly(styrene- benzocyclobutene) domains at 220°C, followed by the removal of poly(methyl methacrylate), provided a robust, crosslinked nanostructure with greater processing and fabrication potential.

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Covalent stabilization of nanostructures: Robust block copolymer templates from novel thermoreactive systems

Abstract

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